Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.58 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.35 |
| ▸ | MGLL | Q99685 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL1313296 | 1.00 | ALDH1A1 (0.58) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Etoglucid SCHEMBL8605397 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL9779665 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Etoglucid SCHEMBL9639500 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL8601791 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL2782095 | 0.98 | ALDH1A1 (0.56) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL9779546 | 0.93 | TSHR (0.57) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL7627265 | 0.93 | TSHR (0.62) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL2937502 | 0.92 | ALDH1A1 (0.61) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 | |
| Methacrylic Acid SCHEMBL21811308 | 0.92 | ALDH1A1 (0.61) | ALDH1A1TSHRSMN1; SMN2TDP1MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114380937-B | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技股份有限公司 | 2023-04-07 | — | — | CN | claimed |
| CN-111574656-B | Fluorine-containing photosensitive resin for black matrix photoresist and resin composition thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-114380937-A | Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-114384759-A | Florenol acrylate for black matrix photoresist, preparation method thereof, resin composition and application method | 江苏博砚电子科技有限公司 | 2022-04-22 | — | — | CN | claimed |
| CN-111574656-A | Fluorine-containing photosensitive resin for black matrix photoresist and resin composition thereof | 江苏博砚电子科技有限公司 | 2020-08-25 | — | — | CN | claimed |
| EP-4394511-A1 | PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR | Toray Industries, Inc. (JP) | 2024-07-03 | — | — | EP | disclosed |
| CN-117716294-A | Photosensitive resin printing plate precursor | 东丽株式会社 | 2024-03-15 | — | — | CN | disclosed |
| CN-117120925-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-11-24 | — | — | CN | disclosed |
| CN-116981998-A | Photosensitive laminate and method for manufacturing circuit board using the same | 可隆工业株式会社 | 2023-10-31 | — | — | CN | disclosed |
| CN-114206971-B | Aqueous cationic polyurethane dispersions | 爱克发有限公司 | 2023-10-27 | — | — | CN | disclosed |
| EP-4265419-A1 | PHOTOSENSITIVE FLEXOGRAPHIC PRINTING PLATE ORIGINAL PLATE, AND FLEXOGRAPHIC PRINTING PLATE | Toray Industries, Inc. (JP) | 2023-10-25 | — | — | EP | disclosed |
| US-20230333473-A1 | PHOTOSENSITIVE RESIN PRINTING PLATE PRECURSOR, AND METHOD OF MANUFACTURING PRINTING PLATE USING SAID PRECURSOR | TORAY INDUSTRIES, INC. (JP) | 2023-10-19 | — | — | US | disclosed |
| EP-1519249-A2 | Method for forming fine relief patterns and methods for producing and copying optical diffraction structures | Dai Nippon Printing Co., Ltd. (JP) | 2005-03-30 | — | — | EP | disclosed |
| US-20050057789-A1 | Method for forming fine concavo-convex patterns, method for producing optical diffraction structure, and method for copying optical diffraction structure | DAI NIPPON PRINTING CO., LTD. (JP) | 2005-03-17 | — | — | US | disclosed |
| US-5856048-A | PROTECTED AGAINST FORGERY AND HAS ENHANCED SECURITY AGAINST SOME IMPROPER USE | DAI NIPPON PRINTING CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| EP-0201323-B1 | Article incorporating a transparent hologramm | DAINIPPON PRINTING CO LTD (JP) | 1994-08-17 | — | — | EP | disclosed |
| EP-0609683-A1 | Relief hologram and process for producing a relief hologram | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1994-08-10 | — | — | EP | disclosed |
| US-4856857-A | Hologram | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1989-08-15 | — | — | US | disclosed |
| EP-0201323-A2 | Article incorporating a transparent hologramm | DAI NIPPON INSATSU KABUSHIKI KAISHA (JP) | 1986-11-12 | — | — | EP | disclosed |
| US-4609267-A | CROSSLINKING, WEAR RESISTANCE, DIELECTRICS | SEIKO EPSON CORPORATION (JP) | 1986-09-02 | — | — | US | disclosed |