SCHEMBL1405910

SCHEMBL1405910

C=CC(=O)OCCC(C)OCCCC

nearest known ligand 0.66

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.66
HPGD P15428 1/20 0.66
ALDH1A1 P00352 5/20 0.47
CYP3A4 P08684 2/20 0.47
ATM Q13315 1/20 0.46
TP53 P04637 3/20 0.43
HIF1A Q16665 3/20 0.43
HSD17B10 Q99714 1/20 0.43
HCAR2 Q8TDS4 3/20 0.41
THRB P10828 4/20 0.41
MAPT P10636 1/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13346682 0.89 TSHR (0.64) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL27603516 0.89 TSHR (0.64) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL29575712 0.86 TSHR (0.47) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL809850 0.85 TSHR (0.62) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL759108 0.85 TSHR (0.52) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL30977033 0.84 TSHR (0.57) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL30977043 0.84 TSHR (0.57) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL30977007 0.84 TSHR (0.57) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL5369955 0.84 TSHR (0.66) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL14407324 0.83 TSHR (0.60) TSHRHPGDALDH1A1CYP3A4ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1610177-B1 PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM JSR CORP (JP) 2011-03-09 EP disclosed
US-7214471-B2 Photosensitive resin film and cured film made therefrom JSR CORPORATION (JP) 2007-05-08 US disclosed
US-20060210912-A1 Alkali-soluble copolymer of p-isopropenylphenol, unsaturated carboxy acid, acrylic ester, and unsaturated aliphatic polycyclic compound, especially isobornyl (meth)acrylate and tricyclo[5.2.1.02,6]decanyl (meth)acrylate; unsaturated compound; and radical polymerization initiator; used for forming bumps JSR CORPORATION (JP) 2006-09-21 US disclosed
EP-1610177-A1 PHOTOSENSITIVE RESIN FILM AND CURED FILM MADE THEREFROM JSR Corporation (JP) 2005-12-28 EP disclosed