SCHEMBL5369955

SCHEMBL5369955

C=CC(=O)OCCC(O)OCCCC

nearest known ligand 0.66

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.66
HPGD P15428 1/20 0.66
ALDH1A1 P00352 5/20 0.47
CYP3A4 P08684 2/20 0.47
ATM Q13315 1/20 0.46
TP53 P04637 3/20 0.43
HIF1A Q16665 3/20 0.43
HSD17B10 Q99714 1/20 0.43
HCAR2 Q8TDS4 3/20 0.41
THRB P10828 4/20 0.41
MAPT P10636 1/20 0.36
RAB9A P51151 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4134515 0.94 TSHR (0.57) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL14039328 0.85 TSHR (0.62) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL1405910 0.84 TSHR (0.66) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL21840405 0.83 TSHR (0.64) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL11581242 0.82 TSHR (0.54) TSHRHPGDALDH1A1CYP3A4ATM
Isopropyl Alcohol SCHEMBL1101251 0.81 TSHR (0.85) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL1331857 0.80
SCHEMBL5681395 0.80 TSHR (1.00) TSHRHPGDALDH1A1CYP3A4ATM
SCHEMBL1330627 0.80
SCHEMBL15037 0.80

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US claimed
CN-110028669-A Negative photosensitive poly amic acid ester resin, resin combination, preparation method and application 明士新材料有限公司 2019-07-19 CN disclosed
US-7201978-B2 Magnetic recording medium TDK CORPORATION (JP) 2007-04-10 US disclosed
US-20060115687-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same and magnetic recording medium using the same TDK CORPORATION (JP) 2006-06-01 US disclosed
US-7026371-B2 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2006-04-11 US disclosed
US-7001955-B2 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2006-02-21 US disclosed
US-20050118459-A1 Magnetic recording medium TDK CORPORATION (JP) 2005-06-02 US disclosed
US-20040241453-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040241497-A1 Electron beam curing resin for magnetic recording medium, method for manufacturing the same, and magnetic recording medium including the same TDK CORPORATION (JP) 2004-12-02 US disclosed
US-20040034165-A1 Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same TDK CORPORATION (JP) 2004-02-19 US disclosed
US-6164785-A Antiglaring film DAI NIPPON PRINTING CO., LTD. (JP) 2000-12-26 US disclosed