Acetic Acid

Acetic Acid

SCHEMBL1409006

CC(=O)O.OCO

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Glycolic Acid SCHEMBL8054489 0.91 FFAR3 (0.58)
Glycolic Acid SCHEMBL2126630 0.91
Acetic Acid SCHEMBL8780995 0.91
Glycolic Acid SCHEMBL28334467 0.88 FFAR3 (0.54)
Glycolic Acid SCHEMBL11884631 0.88 FFAR3 (0.54)
Dihydroxyacetone SCHEMBL8046819 0.88 FFAR3 (0.54)
Glycolic Acid SCHEMBL31186420 0.88 FFAR3 (0.54)
Glycolic Acid SCHEMBL3659535 0.88 FFAR3 (0.54)
Glycolic Acid SCHEMBL28622711 0.88 FFAR3 (0.54)
Dihydroxyacetone SCHEMBL6572373 0.88 FFAR3 (0.54)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113015516-A Oral care compositions and methods for same 高露洁-棕榄公司 2021-06-22 CN claimed
EP-2295438-B2 PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND TOSOH CORP (JP) 2025-03-26 EP disclosed
CN-113015516-A Oral care compositions and methods for same 高露洁-棕榄公司 2021-06-22 CN disclosed
CN-104472483-B Proceras venosatus sex pheromone microsphere and preparing method thereof 广州甘蔗糖业研究所 2017-02-22 CN disclosed
CN-105658052-A Artificially simulating emissions of a chemical compound SG技术公司 2016-06-08 CN disclosed
EP-2295438-B1 PROCESS FOR PRODUCING HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND, AND CATALYST COMPOSITION FOR THE PRODUCTION OF POLYURETHANE RESIN USING THE HYDROXYALKYLTRIETHYLENEDIAMINE COMPOUND TOSOH CORP (JP) 2015-03-18 EP disclosed
US-8247320-B2 Process for producing electrodes for solar cells BASF SE (DE) 2012-08-21 US disclosed
US-20110251328-A1 Silyl-Based Antistatic White Coating CENTRE NATIONAL D'ETUDES SPATIALES (FR) 2011-10-13 US disclosed
US-20110251327-A1 Antistatic White Coating with a Hydroxylated Acrylic Base CENTRE NATIONAL D'ETUDES SPATIALES (FR) 2011-10-13 US disclosed
US-20110151614-A1 PROCESS FOR PRODUCING ELECTRODES FOR SOLAR CELLS BASF SE (DE) 2011-06-23 US disclosed
US-20100170626-A1 METHOD FOR THE PRODUCTION OF POLYMER-COATED METAL FOILS, AND USE THEREOF BASF SE (DE) 2010-07-08 US disclosed
US-20100021657-A1 PROCESS FOR PRODUCING ELECTRICALLY CONDUCTIVE SURFACES BASF SE (DE) 2010-01-28 US disclosed
US-20100009094-A1 METHOD FOR THE PRODUCING STRUCTURED ELECTRICALLY CONDUCTIVE SURFACES BASF SE PATENTS, TRADEMARKS AND LICENSES (DE) 2010-01-14 US disclosed
US-20090321123-A1 METHOD FOR PRODUCING STRUCTURED ELECTRICALLY CONDUCTIVE SURFACES BASF SE Patents, Trademarks and Lincenses (DE) 2009-12-31 US disclosed
US-20090301891-A1 DEVICE AND METHOD FOR ELECTROPLATING BASF SE (DE) 2009-12-10 US disclosed
US-20090285976-A1 METHOD FOR PRODUCING ELECTRICALLY CONDUCTIVE SURFACES ON A SUPPORT BASF SE (DE) 2009-11-19 US disclosed
US-5767175-A ACRYLATED EPOCY RESIN KANSAI PAINT COMPANY, LTD. (JP) 1998-06-16 US disclosed
US-5501150-A Process for the production of a printing plate by inkjet AGFA-GEVAERT, N.V. (BE) 1996-03-26 US disclosed
US-4717710-A CHROMOGEN, TRIAZOLE, AZOMETHINE OR CARBOXYLIC ACID AMINE SALT, AND AN ALCOHOL, AMIDE OR ESTER SOLVENT MATSUI SHIKISO CHEMICAL CO. LTD. (JP) 1988-01-05 US disclosed
EP-0188635-A1 Thermochromic composition MATSUI SHIKISO CHEMICAL CO., LTD (JP) 1986-07-30 EP disclosed