SCHEMBL14093894

SCHEMBL14093894

Oc1cc(O)cc(Nc2cc(S)nc(S)n2)c1

nearest known ligand 0.34

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
▸ HDAC6 Q9UBN7 1/20 0.34
▸ SYK P43405 2/20 0.32
▸ ABCG2 Q9UNQ0 1/20 0.31
▸ LMNA P02545 1/20 0.31
▸ MEN1 O00255 1/20 0.30
▸ GAA P10253 1/20 0.30
▸ KMT2A Q03164 1/20 0.30
▸ SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14608486 0.83 HDAC6 (0.57) HDAC6SYKABCG2MEN1GAA
SCHEMBL14093919 0.67 BRAF (0.49) ABCG2MEN1KMT2ASMN1; SMN2
SCHEMBL8641717 0.66 SNCA (0.35) —
SCHEMBL8641695 0.66 CTDSP1 (0.32) —
SCHEMBL2087642 0.66 BACE1 (0.42) HDAC6SYKLMNAMEN1GAA
SCHEMBL13651800 0.65 — —
Trithiocyanuric Acid SCHEMBL1155854 0.64 — —
SCHEMBL10707871 0.64 — —
SCHEMBL13651825 0.63 AURKA (0.52) SYKGAASMN1; SMN2
SCHEMBL14432567 0.60 GAA (0.34) GAASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
EP-1441254-B1 Photothermographic material FUJIFILM CORP (JP) 2007-03-28 — — EP disclosed
EP-1742105-A2 Photothermographic material Fuji Photo Film Co., Ltd. (JP) 2007-01-10 — — EP disclosed
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