SCHEMBL14093919

SCHEMBL14093919

CC(=O)Nc1cccc(Nc2cc(S)nc(S)n2)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ BRAF P15056 5/20 0.49
▸ MAP3K5 Q99683 1/20 0.48
▸ POLB P06746 1/20 0.47
▸ NR4A1 P22736 1/20 0.47
▸ RAB9A P51151 1/20 0.47
▸ ALDH1A1 P00352 3/20 0.46
▸ CYP1A2 P05177 1/20 0.46
▸ HSD17B10 Q99714 1/20 0.46
▸ ABCG2 Q9UNQ0 3/20 0.46
▸ ABCB1 P08183 1/20 0.46
▸ ABCC1 P33527 1/20 0.46
▸ L3MBTL1 Q9Y468 2/20 0.46
▸ DYRK3 O43781 1/20 0.46
▸ CCNT1 O60563 1/20 0.46
▸ CCNA2 P20248 1/20 0.46
▸ CDK2 P24941 1/20 0.46
▸ CDK9 P50750 1/20 0.46
▸ CDK5 Q00535 1/20 0.46
▸ DYRK1A Q13627 1/20 0.46
▸ CDK5R1 Q15078 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14093860 0.84 TP53 (0.36) BRAFMAP3K5RAB9ADYRK3CCNT1
SCHEMBL14360122 0.82 TERT (0.43) CCNT1CDK9MEN1MAPTKMT2A
SCHEMBL14608486 0.78 HDAC6 (0.57) BRAFPOLBABCG2ABCB1ABCC1
SCHEMBL14093902 0.75 TERT (0.42) POLBCCNT1CDK9SMN1; SMN2
SCHEMBL14124520 0.75 L3MBTL1 (0.40) POLBALDH1A1CYP1A2L3MBTL1CCNT1
SCHEMBL1901172 0.74 ALDH1A1 (0.76) POLBNR4A1RAB9AALDH1A1CYP1A2
SCHEMBL14606449 0.72 MAPT (0.58) POLBRAB9AALDH1A1CYP1A2HSD17B10
SCHEMBL31436022 0.72 MAPT (0.75) MAP3K5POLBNR4A1RAB9AALDH1A1
SCHEMBL1934668 0.72 MAPT (0.75) MAP3K5POLBNR4A1RAB9AALDH1A1
SCHEMBL12968974 0.71 ROCK1 (0.66) BRAFMAP3K5POLBNR4A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
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