SCHEMBL14093905

SCHEMBL14093905

CN(CCCNC(=O)Nc1cccc(-n2nnnc2S)c1)N1CCCC1

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 2/20 0.42
▸ ALDH1A1 P00352 1/20 0.42
▸ CRHBP P24387 1/20 0.42
▸ CRHR2 Q13324 1/20 0.42
▸ MAPK1 P28482 1/20 0.37
▸ CCR3 P51677 4/20 0.37
▸ CYP2D6 P10635 1/20 0.37
▸ ATM Q13315 1/20 0.36
▸ EPHX1 P07099 3/20 0.36
▸ POLB P06746 1/20 0.36
▸ TSHR P16473 1/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ ALOX15 P16050 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14557510 0.89 ALDH1A1 (0.46) RAB9AALDH1A1CRHBPCRHR2MAPK1
SCHEMBL14557521 0.88 ALDH1A1 (0.47) RAB9AALDH1A1CRHBPCRHR2MAPK1
SCHEMBL13683003 0.85 ALDH1A1 (0.48) RAB9AALDH1A1CRHBPCRHR2MAPK1
SCHEMBL14557512 0.83 ALDH1A1 (0.49) RAB9AALDH1A1CRHBPCRHR2MAPK1
SCHEMBL13297725 0.82 EPHX1 (0.41) RAB9AALDH1A1CRHBPCRHR2ATM
SCHEMBL14498660 0.81 EPHX1 (0.57) ALDH1A1EPHX1
SCHEMBL14360486 0.81 EPHX1 (0.40) RAB9AALDH1A1CRHBPCRHR2EPHX1
SCHEMBL14498639 0.81 MAPT (0.53) RAB9AALDH1A1CRHBPCRHR2EPHX1
SCHEMBL13092682 0.79 ALDH1A1 (0.37) RAB9AALDH1A1CRHBPCRHR2MAPK1
SCHEMBL14093921 0.79 MAPT (0.39) RAB9AALDH1A1CRHBPCRHR2CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7410745-B2 Photothermographic material and image forming method using same FUJIFILM CORPORATION (JP) 2008-08-12 — — US disclosed
US-7396638-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2008-07-08 — — US disclosed
US-7309564-B2 Photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-18 — — US disclosed
US-7303864-B2 Black and white photothermographic material and image forming method FUJIFILM CORPORATION (JP) 2007-12-04 — — US disclosed
US-7157218-B2 Suppressed fogging and printout and is excellent in storage stability of an image against stain FUJIFILM CORPORATION (JP) 2007-01-02 — — US disclosed
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