Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | BTK | Q06187 | 1/20 | 0.47 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.37 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.36 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
| ▸ | PREP | P48147 | 2/20 | 0.33 |
| ▸ | ACE | P12821 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | JAK1 | P23458 | 2/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.32 |
| ▸ | JAK2 | O60674 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1409867 | 0.93 | HRH3 (0.41) | BTKHRH3KMT2ACHRM2CHRM1 | |
| SCHEMBL1586789 | 0.91 | HRH3 (0.41) | BTKHRH3CHRM2CHRM1CHRM3 | |
| SCHEMBL17754267 | 0.85 | HRH3 (0.43) | BTKHRH3KMT2AHSD17B10SMN1; SMN2 | |
| SCHEMBL1296379 | 0.84 | BTK (0.61) | BTKHRH3KMT2AAKR1C3AKR1C1 | |
| SCHEMBL1072603 | 0.83 | HRH3 (0.46) | BTKHRH3KMT2AHSD17B10CHRM2 | |
| SCHEMBL5264559 | 0.83 | HRH3 (0.46) | BTKHRH3KMT2AHSD17B10CHRM2 | |
| SCHEMBL10328238 | 0.83 | HRH3 (0.46) | BTKHRH3KMT2AHSD17B10CHRM2 | |
| SCHEMBL2450476 | 0.82 | BTK (0.44) | BTKHRH3KMT2AHSD17B10CHRM2 | |
| SCHEMBL30171988 | 0.82 | HRH3 (0.41) | BTKHRH3KMT2AHSD17B10CHRM2 | |
| SCHEMBL1297691 | 0.82 | BTK (0.44) | BTKHRH3KMT2AAKR1C3AKR1C1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 72 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1182188-B1 | Method for producing carboxylic acid tertiary alkyl ester | HONSHU CHEMICAL IND (JP) | 2011-03-09 | — | — | EP | disclosed |
| US-7666967-B2 | Ester compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-23 | — | — | US | disclosed |
| US-7592407-B2 | a perfluorinated ester compound containing a pyran ring, a hydroxy or protected hydroxy group; able to polymerized into a fluorinated polymer which is used as a base polymer to formulate a resist composition having transparency to laser light; alkali development amenability, and dry etch resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-22 | — | — | US | disclosed |
| US-7488567-B2 | Polymer, resist composition and patterning process | PANASONIC CORPORATION (JP) | 2009-02-10 | — | — | US | disclosed |
| EP-1236745-B1 | Silicon-containing polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2008-07-23 | — | — | EP | disclosed |
| US-7378218-B2 | Polymer, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-05-27 | — | — | US | disclosed |
| US-7344827-B2 | Fine contact hole forming method employing thermal flow process | SHIN-ETSU CHEMICAL CO., INC. (JP) | 2008-03-18 | — | — | US | disclosed |
| EP-1652846-B1 | Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2007-08-22 | — | — | EP | disclosed |
| US-7241553-B2 | Polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-07-10 | — | — | US | disclosed |
| US-7232638-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-20020051936-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-05-02 | — | — | US | disclosed |
| US-20020048724-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-04-25 | — | — | US | disclosed |
| EP-1182188-A2 | Method for producing carboxylic acid tertiary alkyl ester | Honshu Chemical Industry Co., Ltd. (JP) | 2002-02-27 | — | — | EP | disclosed |
| US-20020012871-A1 | Polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20020004569-A1 | Polymer, chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-01-10 | — | — | US | disclosed |
| US-20010055727-A1 | Resist material and method for pattern formation | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-12-27 | — | — | US | disclosed |
| US-20010038969-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. OF (JP) | 2001-11-08 | — | — | US | disclosed |
| US-20010033989-A1 | Novel polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-10-25 | — | — | US | disclosed |
| US-20010018162-A1 | Novel polymers, chemical amplification resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-30 | — | — | US | disclosed |
| EP-1126322-A2 | Fluorine-containing polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-08-22 | — | — | EP | disclosed |