⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8535654 | 0.79 | — | — | |
| SCHEMBL2327010 | 0.72 | — | — | |
| SCHEMBL21142104 | 0.71 | — | — | |
| SCHEMBL7540857 | 0.67 | — | — | |
| SCHEMBL11821885 | 0.65 | — | — | |
| SCHEMBL13207473 | 0.62 | NOS1 (0.33) | — | |
| SCHEMBL10514532 | 0.61 | — | — | |
| SCHEMBL14093966 | 0.61 | — | — | |
| SCHEMBL13955862 | 0.60 | TSHR (0.38) | — | |
| SCHEMBL182542 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2735581-B1 | COMPOSITION AND POLYMER | ASAHI CHEMICAL IND (JP) | 2021-07-14 | — | — | EP | disclosed |
| CN-105754099-B | Composition and polymer | 旭化成株式会社 | 2018-09-18 | — | — | CN | disclosed |
| US-9738757-B2 | Composition and polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2017-08-22 | — | — | US | disclosed |
| US-20160222168-A1 | Composition and Polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-08-04 | — | — | US | disclosed |
| US-9334371-B2 | Composition and polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| EP-2735581-A1 | COMPOSITION AND POLYMER | Asahi Kasei Chemicals Corporation (JP) | 2014-05-28 | — | — | EP | disclosed |
| US-20140121293-A1 | Composition and Polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2014-05-01 | — | — | US | disclosed |
| CN-103502315-A | Composition and polymer | ASAHI KASEI CHEMICALS CORP | 2014-01-08 | — | — | CN | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |