Ethylene Glycol

Ethylene Glycol

SCHEMBL1412484

CC(O)COC(C)CO.OCCO

nearest known ligand 0.48

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.48
MAPK1 P28482 1/20 0.37
HSD17B10 Q99714 1/20 0.36
TSHR P16473 2/20 0.32
LMNA P02545 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ethylene Glycol SCHEMBL3058484 1.00 TDP1 (0.48) TDP1MAPK1HSD17B10TSHRLMNA
Propylene Glycol SCHEMBL28418643 0.98 TDP1 (0.48) TDP1MAPK1HSD17B10TSHRLMNA
Ethylene Glycol SCHEMBL3064316 0.95 TDP1 (0.50) TDP1MAPK1HSD17B10
Ethylene Glycol SCHEMBL11072979 0.95 TDP1 (0.50) TDP1MAPK1HSD17B10
SCHEMBL23248656 0.95
SCHEMBL16542024 0.95
SCHEMBL15111 0.95
SCHEMBL7612087 0.95 TDP1 (0.52) TDP1MAPK1HSD17B10TSHRLMNA
SCHEMBL23248659 0.95
SCHEMBL8747551 0.95

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115887686-A Anti-tumor nano prodrug released in response to ROS (reactive oxygen species), and preparation method and application thereof 华中科技大学同济医学院附属协和医院 2023-04-04 CN claimed
US-11160282-B2 Use of a composition and method for reducing bacterial spores in pulp suspension KEMIRA OYJ (FI) 2021-11-02 US claimed
CN-1114306-A Non-toxic photosensitized active diluent with double functional groups UNIV HUNAN (CN) 1996-01-03 CN claimed
EP-0383373-A2 A detergent composition in liquid form for the pretreatment of textiles Sara Lee/DE N.V. (NL) 1990-08-22 EP claimed
US-4131604-A PROSTHETICS; REACTION OF POLYBUTYLENE GLYCOL, DIISOCYANATE, CROSSLINKER THERMO ELECTRON CORPORATION (US) 1978-12-26 US claimed
CN-117794974-A Flame retardant thermoplastic polyurethane compositions 巴斯夫欧洲公司 2024-03-29 CN disclosed
CN-117795625-A Bus bar at least partially covered with thermoplastic polyurethane composition 巴斯夫欧洲公司 2024-03-29 CN disclosed
CN-114539845-A Ink-jet printing solder-resist ink composition and circuit board thereof 惠州市容大感光科技有限公司 2022-05-27 CN disclosed
CN-106726623-B Single-component photocuring composite material with fluoride ion release characteristic for dental restoration and application thereof 日照沪鸽生物材料有限公司 2020-12-04 CN disclosed
CN-111699224-A Coating composition with improved corrosion resistance PPG工业俄亥俄公司 2020-09-22 CN disclosed
CN-111290225-A Toner and image forming apparatus 佳能株式会社 2020-06-16 CN disclosed
CN-110312768-A Ink-jet ink 惠普发展公司,有限责任合伙企业 2019-10-08 CN disclosed
WO-2009149227-A1 ESTER COMPOUNDS FOR USE IN PERSONAL CARE PRODUCTS LUBRIZOL ADVANCED MATERIALS, INC. (US) 2009-12-10 WO disclosed
CN-101039975-A Polyurethanes, polyurethaneureas and polyureas and use thereof DUTCH POLYMER INST (NL) 2007-09-19 CN disclosed
US-20070191542-A1 Modifier for resin and resin composition using the same and formed article MITSUBISHI RAYON CO., LTD. (JP) 2007-08-16 US disclosed
US-20060293487-A1 POLYURETHANES, POLYURETHANEUREAS AND POLYUREAS AND USE THEREOF STICHTING DUTCH POLYMER INSTITUTE (NL) 2006-12-28 US disclosed
EP-1724299-A1 MODIFIER FOR RESIN AND RESIN COMPOSITION USING THE SAME AND FORMED ARTICLE Mitsubishi Rayon Co., Ltd. (JP) 2006-11-22 EP disclosed
EP-1711548-A1 POLYURETHANES, POLYURETHANEUREAS AND POLYUREAS AND USE THEREOF Dutch Polymer Institute (NL) 2006-10-18 EP disclosed
WO-2005068528-A1 POLYURETHANES, POLYURETHANEUREAS AND POLYUREAS AND USE THEREOF DUTCH POLYMER INSTITUTE (NL) 2005-07-28 WO disclosed
CN-1114306-A Non-toxic photosensitized active diluent with double functional groups UNIV HUNAN (CN) 1996-01-03 CN disclosed