SCHEMBL14130230

SCHEMBL14130230

CC(c1ccc(OC(=O)c2ccc(/N=N/c3ccccc3)cc2)cc1)(c1ccc(OC(=O)c2ccc(/N=N/c3ccccc3)cc2)cc1)c1ccc(OC(=O)c2ccc(/N=N/c3ccccc3)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.61
L3MBTL1 Q9Y468 2/20 0.61
TDP1 Q9NUW8 1/20 0.61
RAB9A P51151 2/20 0.56
CASP3 P42574 1/20 0.56
SENP8 Q96LD8 1/20 0.56
SENP7 Q9BQF6 1/20 0.56
SENP6 Q9GZR1 1/20 0.56
PRSS1 P07477 7/20 0.56
ACR P10323 7/20 0.56
TMPRSS15 P98073 2/20 0.51
ELANE P08246 1/20 0.50
PARP10 Q53GL7 1/20 0.49
KMT2A Q03164 3/20 0.48
MEN1 O00255 1/20 0.48
F2 P00734 1/20 0.48
PRSS2 P07478 1/20 0.48
PRSS3 P35030 1/20 0.48
TRPA1 O75762 1/20 0.47
ALDH1A1 P00352 2/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130429 0.96 MAPT (0.57) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL14130025 0.96 MAPT (0.57) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL14130099 0.91 MAPT (0.61) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL14130027 0.88 MAPT (0.66) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL27279499 0.88 MAPT (0.66) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL9152761 0.86 MAPT (0.81) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL25863316 0.85 MAPT (0.78) MAPTL3MBTL1TDP1RAB9APRSS1
SCHEMBL27677192 0.85 MAPT (0.61) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL14130228 0.83 MAPT (0.60) MAPTL3MBTL1TDP1RAB9ACASP3
SCHEMBL14130095 0.80 PRSS1 (0.58) MAPTL3MBTL1TDP1RAB9ACASP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed