SCHEMBL14130403

SCHEMBL14130403

Cc1ccccc1/N=N/c1ccc(NC(=O)c2cccc(C(=O)Nc3ccc(/N=N/c4ccccc4C)cc3C)c2)c(C)c1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AHR P35869 1/20 0.64
MEN1 O00255 7/20 0.53
KMT2A Q03164 7/20 0.53
ALDH1A1 P00352 3/20 0.53
MAPT P10636 3/20 0.53
LMNA P02545 1/20 0.53
CYP1A2 P05177 2/20 0.49
CYP2C19 P33261 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
CYP2C9 P11712 1/20 0.49
TP53 P04637 1/20 0.49
CYP3A4 P08684 1/20 0.49
TSHR P16473 1/20 0.49
MAPK1 P28482 1/20 0.49
TDP1 Q9NUW8 1/20 0.49
POLB P06746 1/20 0.49
HPGD P15428 1/20 0.49
GAA P10253 1/20 0.48
RAB9A P51151 2/20 0.46
NPC1 O15118 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130007 0.95 AHR (0.66) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL14130404 0.92 AHR (0.66) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL14582010 0.86 AHR (0.60) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL23259385 0.84 KMT2A (0.64) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL26104727 0.84 KMT2A (0.64) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL14612980 0.84 AHR (0.62) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL20762595 0.81 AHR (0.66) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL29506632 0.81 AHR (0.62) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL20762684 0.81 AHR (0.59) AHRMEN1KMT2AALDH1A1MAPT
SCHEMBL14582014 0.81 AHR (0.59) AHRMEN1KMT2AALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed