SCHEMBL14130409

SCHEMBL14130409

O=C(Oc1ccc(/N=N/c2ccccc2)c2ccccc12)c1cccc(C(=O)Oc2ccc(/N=N/c3ccccc3)c3ccccc23)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 6/20 0.50
▸ MAPT P10636 5/20 0.50
▸ MEN1 O00255 4/20 0.50
▸ ESR1 P03372 4/20 0.50
▸ ESR2 Q92731 4/20 0.50
▸ HSD17B10 Q99714 2/20 0.50
▸ SMN1; SMN2 Q16637 2/20 0.50
▸ JAK2 O60674 1/20 0.50
▸ USP2 O75604 1/20 0.50
▸ GAA P10253 1/20 0.50
▸ ALOX15 P16050 1/20 0.50
▸ NPSR1 Q6W5P4 1/20 0.50
▸ PARP1 P09874 1/20 0.45
▸ POLB P06746 1/20 0.45
▸ L3MBTL1 Q9Y468 2/20 0.44
▸ NPC1 O15118 1/20 0.44
▸ MAPK1 P28482 1/20 0.44
▸ TDP1 Q9NUW8 1/20 0.44
▸ ALOX5 P09917 1/20 0.42
▸ GLO1 Q04760 4/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130172 0.94 KMT2A (0.46) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL14130394 0.90 MAPT (0.50) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL14130078 0.86 ALOX5 (0.51) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL14130174 0.82 ALOX5 (0.50) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL14130184 0.78 KMT2A (0.49) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL28136656 0.77 KMT2A (0.58) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL14130187 0.77 SERPINE1 (0.47) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL7181577 0.77 MEN1 (0.45) KMT2AMAPTMEN1ESR1ESR2
SCHEMBL1802827 0.77 MAPT (0.45) KMT2AMAPTMEN1SMN1; SMN2GAA
SCHEMBL373836 0.77 MAPT (0.45) KMT2AMAPTMEN1SMN1; SMN2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 — — US disclosed
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