SCHEMBL14130427

SCHEMBL14130427

O=C(Oc1cc(OC(=O)c2ccc(/N=N/c3ccccc3)cc2)cc(OC(=O)c2ccc(/N=N/c3ccccc3)cc2)c1)c1ccc(/N=N/c2ccccc2)cc1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.64
RAB9A P51151 3/20 0.64
CASP3 P42574 1/20 0.64
SENP8 Q96LD8 1/20 0.64
SENP7 Q9BQF6 1/20 0.64
SENP6 Q9GZR1 1/20 0.64
L3MBTL1 Q9Y468 1/20 0.64
TRPA1 O75762 1/20 0.58
PRSS1 P07477 5/20 0.57
ACR P10323 2/20 0.57
TMPRSS15 P98073 2/20 0.57
KMT2A Q03164 4/20 0.50
MEN1 O00255 3/20 0.50
PARP10 Q53GL7 1/20 0.50
TDP1 Q9NUW8 1/20 0.50
NSD2 O96028 1/20 0.50
F2 P00734 3/20 0.49
PRSS2 P07478 3/20 0.49
PRSS3 P35030 3/20 0.49
ALDH1A1 P00352 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14130027 0.91 MAPT (0.66) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL27279499 0.91 MAPT (0.66) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL27677192 0.87 MAPT (0.61) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL14130228 0.86 MAPT (0.60) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL14130171 0.86 NSD2 (0.59) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL14130095 0.83 PRSS1 (0.58) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL14130182 0.83 MAPT (0.52) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL2755026 0.82 KMT2A (0.68) MAPTRAB9AL3MBTL1KMT2AMEN1
SCHEMBL6001140 0.81 MAPT (0.72) MAPTRAB9ACASP3SENP8SENP7
SCHEMBL5988732 0.81 MAPT (0.72) MAPTRAB9ACASP3SENP8SENP7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed
US-20080161532-A1 COMPOSITION FOR FORMING LOW-DIELECTRIC-CONSTANT FILM, INSULATING FILM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2008-07-03 US disclosed