⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10083141 | 0.88 | HPGD (0.33) | — | |
| SCHEMBL14136148 | 0.82 | ALDH1A1 (0.37) | — | |
| SCHEMBL29117948 | 0.80 | — | — | |
| SCHEMBL29142933 | 0.78 | TSHR (0.30) | — | |
| SCHEMBL10083139 | 0.78 | — | — | |
| SCHEMBL13713860 | 0.77 | — | — | |
| SCHEMBL10083143 | 0.76 | — | — | |
| Formic Acid SCHEMBL27677345 | 0.76 | — | — | |
| SCHEMBL13713857 | 0.76 | — | — | |
| SCHEMBL13713861 | 0.75 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080166660-A1 | Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-07-10 | — | — | US | disclosed |