Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 8/20 | 0.44 |
| ▸ | GLA | P06280 | 7/20 | 0.44 |
| ▸ | NPC1 | O15118 | 6/20 | 0.44 |
| ▸ | MEN1 | O00255 | 6/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.44 |
| ▸ | RAB9A | P51151 | 5/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.44 |
| ▸ | ATM | Q13315 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | HTT | P42858 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2411424 | 0.83 | AKR1C3 (0.39) | MAPTGLANPC1MEN1KMT2A | |
| Benzene SCHEMBL29250968 | 0.82 | MAPT (0.58) | MAPTGLANPC1MEN1KMT2A | |
| SCHEMBL52089 | 0.82 | MAPT (0.58) | MAPTGLANPC1MEN1KMT2A | |
| SCHEMBL63315 | 0.82 | MAPT (0.58) | MAPTGLANPC1MEN1KMT2A | |
| SCHEMBL9503175 | 0.81 | PIM3 (0.39) | MAPTMEN1KMT2AKDM4ENPSR1 | |
| SCHEMBL252615 | 0.79 | PARP14 (0.47) | MAPTKDM4EMAPK1AKR1C3LMNA | |
| SCHEMBL9452537 | 0.78 | MAPT (0.51) | MAPTGLANPC1MEN1KMT2A | |
| SCHEMBL9502084 | 0.70 | PIM3 (0.44) | MAPTGLANPC1MEN1KMT2A | |
| SCHEMBL8746661 | 0.69 | AKR1C3 (0.61) | MAPTMEN1KMT2AKDM4EAKR1C3 | |
| SCHEMBL7117038 | 0.69 | GLA (0.59) | MAPTGLANPC1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105027004-B | Lighographic printing plate precursor and purposes | 伊斯曼柯达公司 | 2019-06-11 | — | — | CN | disclosed |
| EP-2033051-B1 | NEGATIVE-WORKING IMAGEABLE ELEMENTS | EASTMAN KODAK CO (US) | 2016-11-30 | — | — | EP | disclosed |
| EP-2470369-B1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND STACKS | EASTMAN KODAK CO (US) | 2014-03-19 | — | — | EP | disclosed |
| EP-2297611-B1 | ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS | EASTMAN KODAK CO (US) | 2012-07-11 | — | — | EP | disclosed |
| EP-2470369-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND STACKS | Eastman Kodak Company (US) | 2012-07-04 | — | — | EP | disclosed |
| EP-2297611-A1 | ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS | Eastman Kodak Company (US) | 2011-03-23 | — | — | EP | disclosed |
| WO-2011028393-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSORS AND STACKS | EASTMAN KODAK COMPANY (US) | 2011-03-10 | — | — | WO | disclosed |
| WO-2010005488-A1 | ON-PRESS DEVELOPABLE IMAGEABLE ELEMENTS | EASTMAN KODAK COMPANY (US) | 2010-01-14 | — | — | WO | disclosed |
| EP-2033051-A2 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENT | EASTMAN KODAK COMPANY (US) | 2009-03-11 | — | — | EP | disclosed |
| US-7452638-B2 | Negative-working radiation-sensitive compositions and imageable materials | EASTMAN KODAK COMPANY (US) | 2008-11-18 | — | — | US | disclosed |
| WO-2008036170-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | EASTMAN KODAK COMPANY (US) | 2008-03-27 | — | — | WO | disclosed |
| US-20080070152-A1 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS | BANK OF AMERICA, N.A., AS AGENT | 2008-03-20 | — | — | US | disclosed |
| US-20080008957-A1 | Negative-working radiation-sensitive compositions and imageable elements | EASTMAN KODAK COMPANY | 2008-01-10 | — | — | US | disclosed |
| WO-2008002393-A2 | NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE ELEMENT | EASTMAN KODAK COMPANY (US) | 2008-01-03 | — | — | WO | disclosed |