SCHEMBL9502084

SCHEMBL9502084

C=Cc1ccc2c([nH]c3ccccc32)c1C=CC(=O)O

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PIM3 Q86V86 3/20 0.44
PIM1 P11309 2/20 0.44
PIM2 Q9P1W9 1/20 0.44
MEN1 O00255 6/20 0.41
KMT2A Q03164 6/20 0.41
MAPT P10636 6/20 0.41
ALDH1A1 P00352 2/20 0.41
LMNA P02545 2/20 0.41
DYRK1A Q13627 1/20 0.40
MPL P40238 1/20 0.40
KIF11 P52732 1/20 0.39
AHR P35869 1/20 0.38
GABRP O00591 1/20 0.38
GABRD O14764 1/20 0.38
GABRA1 P14867 1/20 0.38
GABRB1 P18505 1/20 0.38
GABRG2 P18507 1/20 0.38
GABRB3 P28472 1/20 0.38
GABRA5 P31644 1/20 0.38
GABRA3 P34903 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL26657973 0.83 KIF11 (0.47) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL9452537 0.82 MAPT (0.51) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL1966744 0.82 PARP14 (0.40) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL159726 0.81 KIF11 (0.49) PIM3PIM1PIM2MEN1KMT2A
Pavettine SCHEMBL1966741 0.81 HDAC1 (0.49) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL27574548 0.80 MEN1 (0.54) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL9503175 0.80 PIM3 (0.39) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL1871961 0.77 PARP1 (0.49) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL9503505 0.77 KIF11 (0.40) PIM3PIM1PIM2MEN1KMT2A
SCHEMBL15413739 0.75 MPL (0.52) PIM3PIM1PIM2MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0235038-B1 VISIBLE-RAY RECORDING HOLOGRAM MATERIAL FUJITSU LIMITED (JP) 1993-05-26 EP claimed
CN-117192672-A Resin film, method for producing resin film, and method for producing phase difference film 日东电工株式会社 2023-12-08 CN disclosed
CN-117192671-A Polarizing plate with phase difference layer 日东电工株式会社 2023-12-08 CN disclosed