SCHEMBL14192802

SCHEMBL14192802

CCC(C)C(=O)Oc1ccc(Cc2ccc(OC(C)(C)CC)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 3/20 0.48
OPRK1 P41145 1/20 0.45
PPARA Q07869 4/20 0.36
PPARG P37231 1/20 0.36
PTGS2 P35354 1/20 0.35
EPHX2 P34913 1/20 0.35
ABCB11 O95342 1/20 0.34
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
TSHR P16473 1/20 0.34
HTR2A P28223 1/20 0.34
PMP22 Q01453 1/20 0.34
PLA2G1B P04054 1/20 0.34
KMT2A Q03164 1/20 0.34
ATG4B Q9Y4P1 1/20 0.34
ATM Q13315 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
GAA P10253 1/20 0.33
XBP1 P17861 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14827265 0.93 ELANE (0.40) ELANEOPRK1PPARAPPARGPTGS2
SCHEMBL14192823 0.90 ELANE (0.49) ELANEOPRK1PPARAPPARGPTGS2
SCHEMBL12903487 0.89 MAPT (0.38) ELANEOPRK1PPARAPPARGABCB11
SCHEMBL13063798 0.89 ELANE (0.50) ELANEOPRK1PPARAPPARGPTGS2
SCHEMBL13265284 0.86 ESR1 (0.39) ELANEOPRK1PPARAPTGS2ABCB11
SCHEMBL13265387 0.86 KDM4E (0.39) ELANEPPARAEPHX2ABCB11CYP1A2
SCHEMBL13957163 0.86 KDM4E (0.39) ELANEPPARAEPHX2ABCB11CYP1A2
SCHEMBL13265442 0.85 ELANE (0.35) ELANEOPRK1PPARAEPHX2ABCB11
SCHEMBL9880585 0.81 ELANE (0.42) ELANEPPARAPPARGABCB11CYP1A2
SCHEMBL13986650 0.80 L3MBTL1 (0.38) PPARAPPARGKMT2AATML3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080146759-A1 Sulfur-Containing Compound, Method for Producing Same, Sulfur-Containing Polymer, and Optical Material IDEMITSU KOSAN CO., LTD (JP) 2008-06-19 US disclosed