⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20485691 | 0.79 | — | — | |
| SCHEMBL15218730 | 0.77 | — | — | |
| SCHEMBL15704317 | 0.75 | ALDH1A1 (0.30) | — | |
| SCHEMBL14814701 | 0.75 | ALDH1A1 (0.30) | — | |
| SCHEMBL2827160 | 0.73 | CA1 (0.32) | — | |
| SCHEMBL50060 | 0.71 | CA1 (0.30) | — | |
| SCHEMBL8716157 | 0.71 | CA1 (0.30) | — | |
| SCHEMBL18771514 | 0.71 | — | — | |
| SCHEMBL15218726 | 0.71 | — | — | |
| SCHEMBL4366853 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11374260-B2 | Nonaqueous electrolyte compositions comprising fluorinated sulfones | SYENSQO SA (BE) | 2022-06-28 | — | — | US | claimed |
| US-11374260-B2 | Nonaqueous electrolyte compositions comprising fluorinated sulfones | SYENSQO SA (BE) | 2022-06-28 | — | — | US | disclosed |
| EP-3465811-B1 | NONAQUEOUS ELECTROLYTE COMPOSITIONS COMPRISING FLUORINATED SULFONES | SOLVAY (BE) | 2021-09-29 | — | — | EP | disclosed |
| US-20200321657-A1 | NONAQUEOUS ELECTROLYTE COMPOSITIONS COMPRISING FLUORINATED SULFONES | SYENSQO SA (BE) | 2020-10-08 | — | — | US | disclosed |
| US-20170025231-A1 | ELECTROLYTE SOLUTION, AND ELECTROCHEMICAL DEVICE | DAIKIN INDUSTRIES, LTD. (JP) | 2017-01-26 | — | — | US | disclosed |
| US-9397368-B2 | Non-aqueous electrolyte solution | DAIKIN INDUSTRIES, LTD. (JP) | 2016-07-19 | — | — | US | disclosed |
| EP-2940109-A1 | IONIC LIQUID, LUBRICATING AGENT, AND MAGNETIC RECORDING MEDIUM | Dexerials Corporation (JP) | 2015-11-04 | — | — | EP | disclosed |
| US-20130224606-A1 | NON-AQUEOUS ELECTROLYTE SOLUTION | DAIKIN INDUSTRIES, LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| WO-2013100158-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |
| US-20080114183-A1 | Monomers comprising superacidic groups, and polymers therefrom | GENERAL ELECTRIC COMPANY (US) | 2008-05-15 | — | — | US | disclosed |