SCHEMBL14217129

SCHEMBL14217129

COc1cc(C(CC(C)(C)C)C(C)C)ccc1O

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.54
CYP3A4 P08684 1/20 0.54
NFKB1 P19838 1/20 0.53
FOS P01100 1/20 0.51
TTR P02766 1/20 0.51
JUN P05412 1/20 0.51
NR3C1 P04150 1/20 0.51
HSD17B1 P14061 1/20 0.51
HSD17B2 P37059 1/20 0.51
BLM P54132 2/20 0.51
PMP22 Q01453 1/20 0.51
SLC22A3 O75751 1/20 0.51
NPSR1 Q6W5P4 1/20 0.49
BCHE P06276 2/20 0.48
TYR P14679 2/20 0.48
ACHE P22303 2/20 0.48
ALOX15 P16050 1/20 0.48
ALOX12 P18054 1/20 0.48
LMNA P02545 1/20 0.47
GAA P10253 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14216835 0.84 TSHR (0.54) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL20000881 0.83 TSHR (0.55) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL13378285 0.82 KDM4E (0.50) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL18976538 0.80 TSHR (0.53) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL14220806 0.79 ESR1 (0.44) TSHRNFKB1BLMALOX15LMNA
SCHEMBL12435656 0.78 TSHR (0.57) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL14960346 0.78 TSHR (0.57) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL18903256 0.77 TSHR (0.53) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL13224269 0.76 TSHR (0.59) TSHRCYP3A4NFKB1FOSTTR
SCHEMBL11603493 0.76 TSHR (0.59) TSHRCYP3A4NFKB1FOSTTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1925979-A1 Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition FUJIFILM Corporation (JP) 2008-05-28 EP disclosed