SCHEMBL14219876

SCHEMBL14219876

CCOc1cc(C(CC(C)C)C(C)(C)C)ccc1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.45
GAA P10253 2/20 0.45
MAPT P10636 2/20 0.45
SMN1; SMN2 Q16637 1/20 0.45
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
TSHR P16473 2/20 0.39
KDM4E B2RXH2 1/20 0.39
TP53 P04637 1/20 0.39
BCHE P06276 2/20 0.39
TYR P14679 2/20 0.39
ACHE P22303 2/20 0.39
TOP2A P11388 1/20 0.39
MGAM O43451 1/20 0.38
ABL1 P00519 1/20 0.38
ABCB1 P08183 1/20 0.38
BCR P11274 1/20 0.38
RORC P51449 1/20 0.38
PIM1 P11309 1/20 0.37
PIM3 Q86V86 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18903256 0.85 TSHR (0.53) TSHRBCHETYRACHECYP3A4
SCHEMBL11608732 0.79 ALDH1A1 (0.51) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL10149066 0.78 ALDH1A1 (0.54) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL29695965 0.77 GAA (0.52) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL14323987 0.77 GAA (0.52) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL14323986 0.77 GAA (0.52) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL10138860 0.77 GAA (0.59) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL9652071 0.75 GAA (0.54) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL11569410 0.75 BCHE (0.58) ALDH1A1GAAMAPTSMN1; SMN2MEN1
SCHEMBL1758270 0.75 ALDH1A1 (0.61) ALDH1A1GAAMAPTSMN1; SMN2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1906248-A1 Resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed
EP-1906241-A1 Resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-04-02 EP disclosed