Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14502487 | 0.90 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL13483516 | 0.87 | MEN1 (0.31) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL14479563 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL75232 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL18409740 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL23011610 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL14632271 | 0.81 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL18785775 | 0.78 | CYP1A2 (0.35) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL12332843 | 0.76 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL25113152 | 0.76 | CYP1A2 (0.34) | MEN1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7344821-B2 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same | FUJIFILM CORPORATION (JP) | 2008-03-18 | — | — | US | disclosed |
| US-7217496-B2 | Fluorinated photoresist materials with improved etch resistant properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-05-15 | — | — | US | disclosed |
| US-7217496-B2 | Fluorinated photoresist materials with improved etch resistant properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-05-15 | — | — | US | disclosed |