Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23011610 | 1.00 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL18409740 | 1.00 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL14632271 | 1.00 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL14479563 | 1.00 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL75110 | 0.90 | — | — | |
| SCHEMBL6853758 | 0.90 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL12332843 | 0.90 | MEN1 (0.33) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL13657461 | 0.85 | MEN1 (0.36) | MEN1NPC1RAB9AKMT2APOLB | |
| SCHEMBL75028 | 0.81 | MEN1 (0.34) | MEN1NPC1RAB9AKMT2A | |
| SCHEMBL14252151 | 0.81 | MEN1 (0.34) | MEN1NPC1RAB9AKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1859 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6794110-B2 | DEVELOPMENT OF LATENT IMAGES | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-09-21 | — | — | US | claimed |
| US-20030171490-A1 | Polymer blend and associated methods of preparation and use | GLOBALFOUNDRIES U.S. INC. | 2003-09-11 | — | — | US | claimed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-11914291-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11860540-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-02 | — | — | US | disclosed |
| US-20230400766-A1 | ONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-30 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157206-B2 | Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-20060264592-A1 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection file material using such copolymers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-11-23 | — | — | US | disclosed |
| US-7109383-B2 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-09-19 | — | — | US | disclosed |
| US-7105618-B2 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-09-12 | — | — | US | disclosed |
| US-6794110-B2 | DEVELOPMENT OF LATENT IMAGES | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-09-21 | — | — | US | disclosed |
| US-20040116750-A1 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-17 | — | — | US | disclosed |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2003-12-18 | — | — | US | disclosed |
| US-20030171490-A1 | Polymer blend and associated methods of preparation and use | GLOBALFOUNDRIES U.S. INC. | 2003-09-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230384677-A1 | ONIUM SALT COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | INSR, INSRR, SLC6A5 | MEN1 3483/4885NPC1 3749/4885RAB9A 3054/4885 |
| US-20030232940-A1 | Fluorine-containing polymerizable monomers and polymers, anti-reflection film materials and resist compositions using same | AFF1, AFF4, AFF2 | MEN1 731/4885NPC1 3089/4885RAB9A 1347/4885 |
| US-12032288-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, COL1A1, RAD51 | MEN1 522/4885NPC1 3722/4885RAB9A 419/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.