⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8962234 | 0.97 | — | — | |
| SCHEMBL11800502 | 0.80 | — | — | |
| SCHEMBL4952832 | 0.78 | — | — | |
| SCHEMBL10698254 | 0.78 | — | — | |
| SCHEMBL11792950 | 0.75 | CA1 (0.31) | — | |
| SCHEMBL1766579 | 0.75 | — | — | |
| SCHEMBL28288141 | 0.73 | CYP2C9 (0.35) | — | |
| SCHEMBL9408823 | 0.72 | ALDH1A1 (0.35) | — | |
| SCHEMBL1767222 | 0.71 | — | — | |
| SCHEMBL11551585 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107615168-B | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-12-19 | — | — | CN | disclosed |
| CN-117008420-A | Radiation-sensitive composition | 日产化学工业株式会社 | 2023-11-07 | — | — | CN | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| CN-113227281-B | Film-forming composition | 日产化学株式会社 | 2023-03-10 | — | — | CN | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| CN-113227281-A | Film-forming composition | 日产化学株式会社 | 2021-08-06 | — | — | CN | disclosed |
| US-10845703-B2 | Film-forming composition containing silicone having crosslinking reactivity | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2020-11-24 | — | — | US | disclosed |
| EP-3359541-B1 | N-SULFONYLATED PYRAZOLO[3,4-B]PYRIDIN-6-CARBOXAMIDES AND METHOD OF USE | ABBVIE OVERSEAS SARL (LU) | 2020-08-05 | — | — | EP | disclosed |
| CN-107075302-B | Film-forming composition containing crosslinking reactive silicon | 日产化学工业株式会社 | 2020-08-04 | — | — | CN | disclosed |
| US-10640462-B2 | Oil gelator | NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) | 2020-05-05 | — | — | US | disclosed |
| US-20110065794-A1 | Wrinkle-preventing and improving composition | SHISEIDO COMPANY, LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100291483-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING BRANCHED POLYHYDROXYSTYRENE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-11-18 | — | — | US | disclosed |
| US-20100168468-A1 | WRINKLE-PREVENTING AND IMPROVING COMPOSITION | KYOWA HAKKO KIRIN CO., LTD. (JP) | 2010-07-01 | — | — | US | disclosed |
| US-20100096663-A1 | PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100075253-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LOW MOLECULAR WEIGHT DISSOLUTION ACCELERATOR | NISSAN CHEMICAL INDUSTRIES , LTD. (JP) | 2010-03-25 | — | — | US | disclosed |
| EP-2154569-A1 | PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS | Nissan Chemical Industries, Ltd. (JP) | 2010-02-17 | — | — | EP | disclosed |
| US-20090311624-A1 | RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2009-12-17 | — | — | US | disclosed |
| EP-1908454-A1 | WRINKLE-PREVENTIVE/AMELIORATING AGENT | SHISEIDO COMPANY, LTD. (JP) | 2008-04-09 | — | — | EP | disclosed |
| US-6153648-A | Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-1016649-A1 | IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2000-07-05 | — | — | EP | disclosed |