⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL270139 | 0.96 | — | — | |
| SCHEMBL10297717 | 0.96 | — | — | |
| SCHEMBL2148806 | 0.96 | — | — | |
| Phosphine SCHEMBL11449080 | 0.92 | — | — | |
| Boric Acid SCHEMBL28030207 | 0.85 | ALDH1A1 (0.33) | — | |
| Acetic Acid SCHEMBL28377606 | 0.79 | FFAR3 (0.44) | — | |
| Ammonia Solution, Strong SCHEMBL5901473 | 0.78 | — | — | |
| Ammonia Solution, Strong SCHEMBL5088015 | 0.78 | — | — | |
| SCHEMBL2441518 | 0.78 | — | — | |
| SCHEMBL21253261 | 0.77 | ALDH1A1 (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 484 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119798586-A | Preparation method of polyisocyanate composition | 万华化学集团股份有限公司 | 2025-04-11 | — | — | CN | claimed |
| CN-115651162-B | Polyisocyanate composition with low free monomer, high compatibility and good dilution stability and preparation method thereof | 万华化学集团股份有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119126507-A | Photoresist stripping liquid, preparation method and application thereof | 浙江奥首材料科技有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118389099-A | Binder composition, slurry composition, electrode, and secondary battery | 上海百公里新材料科技有限公司 | 2024-07-26 | — | — | CN | claimed |
| CN-118165226-A | Preparation method of polyisocyanate composition | 万华化学（宁波）有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-118165221-A | Allophanate composition, polyisocyanate composition, and preparation methods and applications thereof | 万华化学（宁波）有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-114249868-B | Storage-stable polyisocyanate composition and preparation method thereof | 万华化学集团股份有限公司 | 2023-12-19 | — | — | CN | claimed |
| CN-113698572-B | Polyisocyanate composition, preparation method and application | 万华化学（宁波）有限公司 | 2023-12-19 | — | — | CN | claimed |
| CN-116954025-A | Positive photosensitive resin composition and application thereof | 安徽觅拓材料科技有限公司 | 2023-10-27 | — | — | CN | claimed |
| CN-116854890-A | Preparation method of polyisocyanate composition | 万华化学集团股份有限公司 | 2023-10-10 | — | — | CN | claimed |
| WO-1999016855-A1 | CLEANING COMPOSITIONS AND METHODS FOR CLEANING RESIN AND POLYMERIC MATERIALS USED IN MANUFACTURE | KYZEN CORPORATION (US) | 1999-04-08 | — | — | WO | claimed |
| EP-0886547-A1 | CLEANING WAFER SUBSTRATES OF METAL CONTAMINATION WHILE MAINTAINING WAFER SMOOTHNESS | Mallinckrodt Baker, Inc. (US) | 1998-12-30 | — | — | EP | claimed |
| WO-1998016330-A1 | CLEANING WAFER SUBSTRATES OF METAL CONTAMINATION WHILE MAINTAINING WAFER SMOOTHNESS | MALLINCKRODT BAKER, INC. (US) | 1998-04-23 | — | — | WO | claimed |
| EP-0597460-B1 | Method of processing organic quaternary ammonium hydroxide-containing waste liquid | TAMA CHEMICALS CO LTD (JP) | 1997-01-22 | — | — | EP | claimed |
| US-5498293-A | TREATMENT WITH ALKALINE SOLUTION AND AMPHOTERIC SURFACTANT | MALLINCKRODT BAKER, INC. (US) | 1996-03-12 | — | — | US | claimed |
| EP-0690483-A2 | Cleaning wafer substrates of metal contamination while maintaining wafer smoothness | MALLINCKRODT BAKER, Inc. (US) | 1996-01-03 | — | — | EP | claimed |
| US-5466389-A | Cleaning compounds with metal free base and surfactant | J. T. BAKER INC. (US) | 1995-11-14 | — | — | US | claimed |
| EP-0678571-A2 | pH Adjusted nonionic surfactant containing alkaline cleaner composition for cleaning microelectronics substrates | MALLINCKRODT BAKER, Inc. (US) | 1995-10-25 | — | — | EP | claimed |
| US-5318677-A | Electrocleaning by dipping in an aqueous bath of glycerol and a phosphate salt selected from the group consisting of an alkali metal, ammonium phosphate, polyphosphate or pyrophosphate | FUTURE AUTOMATION, INC. (US) | 1994-06-07 | — | — | US | claimed |
| US-5174816-A | SURFACE TREATING AGENT FOR ALUMINUM LINE PATTERN SUBSTRATE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1992-12-29 | — | — | US | claimed |