SCHEMBL1426540

SCHEMBL1426540

CCC1(C)CC1C=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13663213 0.78
SCHEMBL13409655 0.72
SCHEMBL13409668 0.72
SCHEMBL13409654 0.72
SCHEMBL13409648 0.72
SCHEMBL13409651 0.72
SCHEMBL13409649 0.72
SCHEMBL3928539 0.70 ALDH1A1 (0.34)
SCHEMBL13409656 0.70 ALDH1A1 (0.34)
SCHEMBL13409657 0.70 ALDH1A1 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113227281-B Film-forming composition 日产化学株式会社 2023-03-10 CN disclosed
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
EP-3524656-A1 NOVEL HYDROGELATOR National University Corporation Shizuoka University (JP) 2019-08-14 EP disclosed
US-20190241598-A1 NOVEL HYDROGELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2019-08-08 US disclosed
CN-105612459-B The lower membrane formation composition of resist containing metal containing polyacid 日产化学工业株式会社 2019-06-07 CN disclosed
CN-109790439-A New hydrogel agent 国立大学法人静冈大学 2019-05-21 CN disclosed
US-10289002-B2 Electron beam resist underlayer film-forming composition containing lactone-structure-containing polymer NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-05-14 US disclosed
US-20180362454-A1 OIL GELATOR NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2018-12-20 US disclosed
EP-3381995-A1 OIL-GELLING AGENT National University Corporation Shizuoka University (JP) 2018-10-03 EP disclosed
US-10042247-B2 Mask blank, method for manufacturing mask blank and transfer mask HOYA CORPORATION (JP) 2018-08-07 US disclosed
EP-2154569-A1 PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS Nissan Chemical Industries, Ltd. (JP) 2010-02-17 EP disclosed
CN-101636392-A Process for production of optically active epoxy compound NISSAN CHEMICAL IND LTD 2010-01-27 CN disclosed
US-20090311624-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-12-17 US disclosed
CN-101558358-A Resist underlayer film forming composition containing low molecular weight dissolution promoter NISSAN CHEMICAL IND LTD (JP) 2009-10-14 CN disclosed
CN-101506736-A Resist underlayer film forming composition containing liquid additive NISSAN CHEMICAL IND LTD (JP) 2009-08-12 CN disclosed
CN-101429200-A Tricyclic benzopyran compound as anti-arrhythmic agents NISSAN CHEMICAL IND LTD (JP) 2009-05-13 CN disclosed
CN-1934116-A Tricyclic benzopyran compounds useful as antiarrhythmic agents NISSAN CHEMICAL IND LTD (JP) 2007-03-21 CN disclosed
US-6153648-A Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2000-11-28 US disclosed
CN-1268111-A Iodopropagylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same NISSAN CHEMICAL IND LTD (JP) 2000-09-27 CN disclosed
EP-1016649-A1 IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME Nissan Chemical Industries, Ltd. (JP) 2000-07-05 EP disclosed