⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14265460 | 0.94 | — | — | |
| SCHEMBL14265464 | 0.92 | — | — | |
| SCHEMBL30277230 | 0.92 | — | — | |
| SCHEMBL30277176 | 0.92 | — | — | |
| SCHEMBL5349532 | 0.92 | — | — | |
| SCHEMBL10529773 | 0.86 | — | — | |
| SCHEMBL3740304 | 0.80 | — | — | |
| SCHEMBL14265492 | 0.79 | — | — | |
| SCHEMBL10412067 | 0.78 | — | — | |
| SCHEMBL6859814 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4597547-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-119768898-A | Chemical solution, method for producing modified substrate, and method for producing laminate | 富士胶片株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| US-20250066621-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR MANUFACTURING SUBSTRATE | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-02-27 | — | — | US | disclosed |
| WO-2024070526-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | 富士フイルム株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2023234370-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| WO-2023234368-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | セントラル硝子株式会社 | 2023-12-07 | — | — | WO | disclosed |
| US-11817310-B2 | Bevel portion treatment agent composition and method of manufacturing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20230282473-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230282474-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES AND SURFACE TREATMENT AGENT COMPOSITION | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-09-07 | — | — | US | disclosed |
| WO-2023127942-A1 | COMPOSITION FOR FILM FORMATION AND METHOD FOR PRODUCING SUBSTRATE | セントラル硝子株式会社 | 2023-07-06 | — | — | WO | disclosed |
| EP-4155375-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATES, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| EP-4155376-A1 | SURFACE TREATMENT METHOD FOR SEMICONDUCTOR SUBSTRATE, AND SURFACE TREATMENT AGENT COMPOSITION | Central Glass Company, Limited (JP) | 2023-03-29 | — | — | EP | disclosed |
| US-7344235-B2 | Ink composition for ink jet recording, ink cartridge, nozzle plate for ink jet recording, ink jet head, and recording apparatus | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |