⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1253273 | 0.93 | — | — | |
| SCHEMBL14265415 | 0.91 | — | — | |
| SCHEMBL61569 | 0.91 | — | — | |
| SCHEMBL1462442 | 0.91 | — | — | |
| SCHEMBL14265416 | 0.91 | — | — | |
| SCHEMBL5599110 | 0.91 | — | — | |
| SCHEMBL64375 | 0.91 | — | — | |
| SCHEMBL19652363 | 0.91 | — | — | |
| SCHEMBL14351312 | 0.91 | — | — | |
| SCHEMBL29396996 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113930155-B | Hydrophobic coating liquid, glass and preparation method thereof | 福耀玻璃工业集团股份有限公司 | 2022-05-31 | — | — | CN | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| EP-4597547-A1 | CHEMICAL SOLUTION, METHOD FOR PRODUCING MODIFIED SUBSTRATE, AND METHOD FOR PRODUCING LAYERED BODY | FUJIFILM Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| US-20250215024-A1 | CHEMICAL LIQUID, MANUFACTURING METHOD OF MODIFIED SUBSTRATE, AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2025-07-03 | — | — | US | disclosed |
| WO-2025105151-A1 | METHOD OF MANUFACTURING TREATED SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2025-05-22 | — | — | WO | disclosed |
| EP-4535406-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| EP-4535405-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | Central Glass Company, Limited (JP) | 2025-04-09 | — | — | EP | disclosed |
| CN-119768898-A | Chemical solution, method for producing modified substrate, and method for producing laminate | 富士胶片株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-113169060-B | Chamfering part treating agent composition and method for manufacturing wafer | 中央硝子株式会社 | 2025-04-01 | — | — | CN | disclosed |
| WO-2016060723-A2 | DURABLE SUPERHYDROPHOBIC SURFACES | UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC. (US) | 2016-04-21 | — | — | WO | disclosed |
| US-20150295176-A1 | SURFACE MODIFIER FOR METAL ELECTRODE, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-15 | — | — | US | disclosed |
| EP-2927936-A1 | SURFACE MODIFYING AGENT FOR METAL ELECTRODES, SURFACE-MODIFIED METAL ELECTRODE, AND METHOD FOR PRODUCING SURFACE-MODIFIED METAL ELECTRODE | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-10-07 | — | — | EP | disclosed |
| US-7824043-B2 | Reflection preventing layered product and optical member | ZEON CORPORATION (JP) | 2010-11-02 | — | — | US | disclosed |
| CN-100480737-C | Reflection preventing laminated body and optical member | ZEON CORP (JP) | 2009-04-22 | — | — | CN | disclosed |
| US-7344235-B2 | Ink composition for ink jet recording, ink cartridge, nozzle plate for ink jet recording, ink jet head, and recording apparatus | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-03-18 | — | — | US | disclosed |
| US-20080013177-A1 | Reflection Preventing Layered Product and Optical Member | ZEON CORPORATION (JP) | 2008-01-17 | — | — | US | disclosed |
| CN-101002114-A | Reflection preventing laminated body and optical member | ZEON CORP (JP) | 2007-07-18 | — | — | CN | disclosed |
| CN-1379250-A | Antireflection substrate having weak reflective colour | SUMITOMO CHEMICAL CO (JP) | 2002-11-13 | — | — | CN | disclosed |
| US-20020142151-A1 | Antireflection substrate with weak reflective color | SUMITOMO CHEMICAL COMPANY. LIMITED | 2002-10-03 | — | — | US | disclosed |