SCHEMBL1426643

SCHEMBL1426643

CCC1([C]=O)CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1425923 0.88
SCHEMBL16009134 0.75
SCHEMBL6141332 0.73
SCHEMBL6141585 0.69 TSHR (0.36)
SCHEMBL2288386 0.69
SCHEMBL873746 0.59
SCHEMBL2292115 0.59
SCHEMBL5595396 0.59
SCHEMBL1431683 0.57 USP2 (0.37)
SCHEMBL20213911 0.57

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107615168-B Radiation-sensitive composition 日产化学工业株式会社 2023-12-19 CN disclosed
CN-117008420-A Radiation-sensitive composition 日产化学工业株式会社 2023-11-07 CN disclosed
US-20230125270-A1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-04-27 US disclosed
CN-113227281-B Film-forming composition 日产化学株式会社 2023-03-10 CN disclosed
US-11561472-B2 Radiation sensitive composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-01-24 US disclosed
CN-113227281-A Film-forming composition 日产化学株式会社 2021-08-06 CN disclosed
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-24 US disclosed
CN-107075302-B Film-forming composition containing crosslinking reactive silicon 日产化学工业株式会社 2020-08-04 CN disclosed
US-10640462-B2 Oil gelator NATIONAL UNIVERSITY CORPORATION SHIZUOKA UNIVERSITY (JP) 2020-05-05 US disclosed
WO-2020085508-A1 FILM-FORMING COMPOSITION 日産化学株式会社 2020-04-30 WO disclosed
US-6245476-B1 SUPPORTS WITH DIAZO COMPOUNDS IN MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2001-06-12 US disclosed
US-6153648-A Iodopropargylamine compounds, and industrial antimicrobial and antifungal agents, algicides, and antifouling agents containing the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2000-11-28 US disclosed
EP-1016649-A1 IODOPROPAGYLAMINE COMPOUNDS, AND INDUSTRIAL ANTIMICROBIAL AND ANTIFUNGAL AGENTS, ALGICIDES, AND ANTIFOULING AGENTS CONTAINING THE SAME Nissan Chemical Industries, Ltd. (JP) 2000-07-05 EP disclosed
US-6017672-A MIXTURE OF DIAZONIUM SALT HAVING ABSORPTION WAVELENGTH SHORTER THAN 350 NANOMETERS AND A THERMALLY REACTIVE COUPLER CONTAINED WITHIN RECORDING LAYER COATED ONTO SUPPORT; STORAGE STABILITY, PHOTOSTABILITY, HIGH COLOR DENSITY FUJI PHOTO FILM CO., LTD. (JP) 2000-01-25 US disclosed
US-5998082-A DIHYDROCARBYLOXYPHENYL DIAZONIUM COMPOUND FUJI PHOTO FILM CO., LTD. (JP) 1999-12-07 US disclosed
EP-0914307-A1 ENZYMATICALLY REMOVABLE LINKERS FOR SOLID PHASE SYNTHESIS BASF AKTIENGESELLSCHAFT (DE) 1999-05-12 EP disclosed
EP-0827020-A1 Thermal recording material FUJI PHOTO FILM CO., LTD. (JP) 1998-03-04 EP disclosed
WO-1998001406-A1 ENZYMATICALLY REMOVABLE LINKERS FOR SOLID PHASE SYNTHESIS BASF AKTIENGESELLSCHAFT (DE) 1998-01-15 WO disclosed
US-5397688-A Yellow acylacetamide-based coupler FUJI PHOTO FILM CO., LTD. (JP) 1995-03-14 US disclosed
EP-0583004-A1 Silver halide photographic material FUJI PHOTO FILM CO., LTD. (JP) 1994-02-16 EP disclosed