2-Pentanol

2-Pentanol

SCHEMBL143322

CCCC(C)O.CCCCOCCCC

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.52
HSD17B10 Q99714 2/20 0.44
HTT P42858 2/20 0.41
MAPT P10636 2/20 0.41
MEN1 O00255 1/20 0.41
THRB P10828 1/20 0.41
KMT2A Q03164 1/20 0.41
USP2 O75604 1/20 0.41
SPHK1 Q9NYA1 2/20 0.40
CYP3A4 P08684 2/20 0.40
LPAR5 Q9H1C0 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
CYP1A2 P05177 1/20 0.35
CYP2C19 P33261 1/20 0.35
ADRB2 P07550 1/20 0.35
ADRB1 P08588 1/20 0.35
ADRB3 P13945 1/20 0.35
ALDH1A1 P00352 1/20 0.34
CES2 O00748 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
2-Pentanol SCHEMBL5539134 0.93 HTT (0.50) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL12842087 0.91 TSHR (0.52) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL606657 0.91 TSHR (0.52) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL4113825 0.91 TSHR (0.52) TSHRHSD17B10HTTMAPTMEN1
2-Heptanol SCHEMBL142134 0.88 TSHR (0.50) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL27618582 0.88 TSHR (0.50) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL15508257 0.88 TSHR (0.50) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL16510215 0.86 HTT (0.48) TSHRHSD17B10HTTMAPTMEN1
1,3-Butanediol SCHEMBL4113829 0.86 TSHR (0.60) TSHRHSD17B10HTTMAPTMEN1
SCHEMBL7742001 0.86 HTT (0.48) TSHRHSD17B10HTTMAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-8741554-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-03 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20100304297-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed