SCHEMBL14338304

SCHEMBL14338304

CC1CC2CC1CCC2C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ SLC1A2 P43004 3/20 0.38
▸ SLC1A1 P43005 3/20 0.38
▸ GABRR1 P24046 5/20 0.37
▸ GRM2 Q14416 1/20 0.32
▸ PEPD P12955 1/20 0.32
▸ GABRR2 P28476 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10214195 0.84 GABRR1 (0.39) SLC1A2SLC1A1GABRR1GRM2GABRR2
SCHEMBL22645802 0.84 GABRR1 (0.39) SLC1A2SLC1A1GABRR1GRM2GABRR2
SCHEMBL25772541 0.73 EPHX1 (0.31) —
SCHEMBL301208 0.72 — —
SCHEMBL14087178 0.72 — —
SCHEMBL14186720 0.72 — —
SCHEMBL18553312 0.72 — —
SCHEMBL18375852 0.72 — —
SCHEMBL1375335 0.72 — —
SCHEMBL438545 0.72 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7306853-B2 Ultra-large scale integrated interconnect structures; forming via and/or line patterns in a curable caged polysilsesquioxane, curing and filling the patterns with a conductor; combines the functions of a photoresist and a conventional low-k dielectric into a single material INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2007-12-11 — — US disclosed
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