SCHEMBL1434249

SCHEMBL1434249

C=CC(=O)OC1CCCCC12C(=O)OC2=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL967974 0.78 ALDH1A1 (0.33)
SCHEMBL23494199 0.73 UGT2B7 (0.30)
SCHEMBL28503600 0.73 CYP2C19 (0.30)
SCHEMBL28320632 0.72 MAPT (0.33)
SCHEMBL18051636 0.72 CYP2C19 (0.33)
SCHEMBL28319498 0.72 MAPT (0.33)
SCHEMBL10864911 0.70 MAPT (0.31)
SCHEMBL11362509 0.69 GAA (0.33)
SCHEMBL28091188 0.68 CYP2C19 (0.33)
SCHEMBL27886909 0.68 CYP2C19 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11279731-B2 Ligand functional substrates 3M INNOVATIVE PROPERTIES COMPANY (US) 2022-03-22 US disclosed
EP-1819737-B1 PHOTOCURABLE MICHAEL ADDITION POLYMERS 3M INNOVATIVE PROPERTIES CO (US) 2011-03-30 EP disclosed
US-7307106-B2 Photocurable Michael addition polymers 3M INNOVATIVE PROPERTIES COMPANY (US) 2007-12-11 US disclosed
EP-1819737-A2 PHOTOCURABLE MICHAEL ADDITION POLYMERS 3M Innovative Properties Company (US) 2007-08-22 EP disclosed
WO-2006065369-A2 PHOTOCURABLE MICHAEL ADDITION POLYMERS 3M INNOVATIVE PROPERTIES COMPANY (US) 2006-06-22 WO disclosed
US-20060128825-A1 Photocurable michael addition polymers 3M INNOVATIVE PROPERTIES COMPANY 2006-06-15 US disclosed