SCHEMBL143520

SCHEMBL143520

COCC(C)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11933048 1.00
SCHEMBL1708891 1.00
Acetic Acid SCHEMBL8230941 0.95 GABRR1 (0.41)
SCHEMBL3632408 0.84 GABRR1 (0.37)
SCHEMBL14177527 0.84 GABRR1 (0.37)
SCHEMBL21625547 0.83 SLC1A3 (0.38)
SCHEMBL8930201 0.83 TSHR (0.44)
SCHEMBL1619607 0.82 GABRR1 (0.35)
SCHEMBL21625549 0.82 SMN1; SMN2 (0.41)
SCHEMBL7695891 0.82 FOLH1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2986 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122095027-A Modified maleated natural oil-based reaction products and slurry compositions containing the same 2026-05-26 CN claimed
US-12619144-B2 Positive photosensitive resin composition DONGJIN SEMICHEM CO., LTD. (KR) 2026-05-05 US claimed
EP-3870960-B1 CHEMICAL LIQUID MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2026-04-15 EP claimed
EP-4072992-B1 COMPOSITION SAMSUNG ELECTRONICS CO LTD (KR) 2026-04-08 EP claimed
EP-3883663-B9 CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2026-02-25 EP claimed
EP-3883663-B1 CHEMICAL LIQUID MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF CHEMICAL LIQUID FUJIFILM ELECTRONIC MAT USA INC (US) 2025-10-01 EP claimed
WO-2025106697-A1 BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING HUSTAD PHILLIP DENE (US) 2025-05-22 WO claimed
WO-2025106703-A1 BIO-BASED COMPOSITIONS FOR PHOTORESISTS AND PATTERNING HUSTAD PHILLIP DENE (US) 2025-05-22 WO claimed
US-12153345-B2 Photosensitive resin composition SUMITOMO BAKELITE CO., LTD. (JP) 2024-11-26 US claimed
CN-117836716-A Photosensitive resin composition and display device including the same 株式会社东进世美肯 2024-04-05 CN claimed
EP-0856034-A1 THICK PAINT STRIPPING COMPOSITION ELF ATOCHEM S.A. (FR) 1998-08-05 EP claimed
US-5788757-A SOLUTION OF METAL CARBOXYLATE IN ESTER SOLVENT, FORMATION OF STRONTIUM BARIUM TITANTES, STRONTIUM BISMUTH TANTALATES AND/OR NIOBATES, ANNEALING SYMETRIX CORPORATION (US) 1998-08-04 US claimed
WO-1998028466-A1 COMPOSITION AND PROCESS FOR FABRICATING METAL OXIDE FILMS SYMETRIX CORPORATION (US) 1998-07-02 WO claimed
US-5772925-A ORGANIC SOLVENT-SOLUBLE POLYIMIDE, SOLVENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-06-30 US claimed
EP-0627500-B1 Defluxing agent and cleaning method FUJITSU LTD (JP) 1998-03-04 EP claimed
EP-0429800-B2 Process for preparing unsaturated carboxylic acid ester MITSUBISHI GAS CHEMICAL CO (JP) 1997-10-08 EP claimed
WO-1997014757-A1 THICK PAINT STRIPPING COMPOSITION ELF ATOCHEM S.A. (FR) 1997-04-24 WO claimed
EP-0408635-B1 TRANSESTERIFICATION OF ALKOXYESTERS EASTMAN KODAK CO (US) 1994-02-23 EP claimed
EP-0379691-A1 Process for preparing unsaturated carboxylic acid or ester thereof MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1990-08-01 EP claimed
US-4814492-A Method of preparing alkyl acrylates TEXACO INC. (US) 1989-03-21 US claimed