Methacrylic Acid

Methacrylic Acid

SCHEMBL1436671

C=C(C)C(=O)O.CCO

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

MMP1MMP13MMP7MMP8polrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of Methacrylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 97 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116947630-A Method for continuously manufacturing 1-ethanol methacrylate in microchannel reactor 上海吉奉生物科技有限公司 2023-10-27 CN claimed
CN-115920137-A Ray-blocking 3D printing photosensitive resin and application thereof 江南大学附属医院 2023-04-07 CN claimed
CN-112759670-B Mussel bionic functionalized hydrophilic polymer and hydrophilic polymer network modified super-hydrophilic net membrane as well as preparation method and application thereof 中国石油大学(华东) 2022-03-15 CN claimed
EP-3923853-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS Kulzer GmbH (DE) 2021-12-22 EP claimed
EP-3924186-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS Kulzer GmbH (DE) 2021-12-22 EP claimed
CN-112759670-A Mussel bionic functionalized hydrophilic polymer and hydrophilic polymer network modified super-hydrophilic net membrane as well as preparation method and application thereof 中国石油大学(华东) 2021-05-07 CN claimed
WO-2020182810-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS KULZER GMBH (DE) 2020-09-17 WO claimed
WO-2020182814-A1 RADIATION-CURABLE COMPOSITION FOR USE IN RAPID PROTOTYPING OR RAPID MANUFACTURING METHODS KULZER GMBH (DE) 2020-09-17 WO claimed
US-5725576-A OLIGOURETHANE METHACRYLATE POLYMER MEZHOTRASLEVOI NAUCHNO-TEKHNICHESKY KOMPLEX "MIKROKHIRURGIA GLAZA" (RU) 1998-03-10 US claimed
CN-117107548-B Preparation method and application of composite deacidification material with high alkali reserve and hydrophobicity after deacidification treatment of paper 南京大学 2024-02-09 CN disclosed
CN-114341258-B Non-adhesive composition 优迈特株式会社 2024-02-02 CN disclosed
CN-117300431-A Metal soldering paste for packaging power device and preparation method and application thereof 北京工业大学 2023-12-29 CN disclosed
CN-117270105-A Optical waveguide preparation method by femtosecond laser wet etching and liquid pouring and optical waveguide 西安交通大学 2023-12-22 CN disclosed
CN-117107548-A Preparation method and application of composite deacidification material with high alkali reserve and hydrophobicity after deacidification treatment of paper 南京大学 2023-11-24 CN disclosed
US-4853318-A Process for processing silver halide color photographic material using a developer comprising substantially no benzyl alcohol FUJI PHOTO FILM CO., LTD. (JP) 1989-08-01 US disclosed
US-4851568-A CATALYTIC REACTION OF ETHYL (METH)ACRYATE WITH AMINOALCOHOL NORSOLOR (FR) 1989-07-25 US disclosed
EP-0306294-A1 Apparatus for treating photographic process waste liquor KONICA CORPORATION (JP) 1989-03-08 EP disclosed
EP-0223605-A2 Method for evaporation treatment of photographic processing waste solution and device therefor KONICA CORPORATION (JP) 1987-05-27 EP disclosed
US-4548891-A PHOTORESISTS; HEAT RESISTANCE; THICKNESS; SHARPNESS CIBA GEIGY CORPORATION (US) 1985-10-22 US disclosed
US-4126466-A Composite, mask-forming, photohardenable elements E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-11-21 US disclosed