SCHEMBL14397017

SCHEMBL14397017

CCCOC1CC2OC1CC21COC(=O)C1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 4/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14986032 0.93 PPP5C (0.36) PRKCA
SCHEMBL19152289 0.78
SCHEMBL15113759 0.76 CYP3A4 (0.33)
SCHEMBL14354915 0.75 PRKCA (0.30) PRKCA
SCHEMBL12013719 0.75 CYP3A4 (0.30)
SCHEMBL18435896 0.75 CYP3A4 (0.30)
SCHEMBL9965118 0.75 CYP3A4 (0.30)
SCHEMBL18768408 0.74
SCHEMBL10158317 0.72
SCHEMBL14355145 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2172807-B1 Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process SHINETSU CHEMICAL CO (JP) 2014-06-18 EP disclosed
EP-1845132-A2 Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method Shinetsu Chemical Co., Ltd. (JP) 2007-10-17 EP disclosed