SCHEMBL1442020

SCHEMBL1442020

O=C1CCC(OC2CCCCO2)CC1

nearest known ligand 0.34

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
ABCB1 P08183 1/20 0.31
OSBP P22059 1/20 0.31
OSBP2 Q969R2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9785228 0.82 OSBP (0.33) MEN1KMT2AOSBPOSBP2
SCHEMBL16411045 0.82 OSBP (0.33) MEN1KMT2AOSBPOSBP2
SCHEMBL1443639 0.81 OSBP (0.31) OSBPOSBP2
SCHEMBL2330280 0.80 OSBP (0.32) MEN1KMT2AOSBPOSBP2
SCHEMBL25238788 0.78 PDE4A (0.31)
SCHEMBL31496260 0.78 OSBP (0.35) ABCB1OSBPOSBP2
SCHEMBL9452122 0.77 OSBP (0.32) MEN1KMT2AABCB1OSBPOSBP2
SCHEMBL21047623 0.75 TRIM24 (0.38) KMT2A
SCHEMBL14958625 0.75 OSBP (0.34) OSBPOSBP2
SCHEMBL18025098 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9459532-B2 Radiation-sensitive resin composition, polymer and compound JSR CORPORATION (JP) 2016-10-04 US disclosed
US-9459532-B2 Radiation-sensitive resin composition, polymer and compound JSR CORPORATION (JP) 2016-10-04 US disclosed
US-20130216951-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND JSR CORPORATION (JP) 2013-08-22 US disclosed
US-20130216951-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND JSR CORPORATION (JP) 2013-08-22 US disclosed
EP-2623558-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND JSR Corporation (JP) 2013-08-07 EP disclosed
WO-2013047536-A1 PHOTORESIST COMPOSITION AND RESIST PATTERN FORMING METHOD JSR株式会社 (JP) 2013-04-04 WO disclosed
EP-2475668-A1 ETHER DERIVATIVES OF BICYCLIC HETEROARYLS Novartis AG (CH) 2012-07-18 EP disclosed
US-20120165310-A1 ETHER DERIVATIVES OF BICYCLIC HETEROARYLS NOVARTIS AG (CH) 2012-06-28 US disclosed
WO-2011029915-A1 ETHER DERIVATIVES OF BICYCLIC HETEROARYLS NOVARTIS AG (CH) 2011-03-17 WO disclosed
US-3960961-A 4'-Fluoro-4-{[4-(phenyl)cyclohexyl]amino}butyrophenones and the salts thereof THE UPJOHN COMPANY (US) 1976-06-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120165310-A1 ETHER DERIVATIVES OF BICYCLIC HETEROARYLS ETV6, CYP11B2, CYP11B1 MEN1 764/4885KMT2A 819/4885ABCB1 51/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.