SCHEMBL14451908

SCHEMBL14451908

CC(=O)Nc1cccc(NC(=O)OCCOC(=O)Nc2cccc(C)c2)c1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 2/20 0.71
HPGD P15428 4/20 0.56
LMNA P02545 3/20 0.54
MAPK1 P28482 2/20 0.54
MAPT P10636 1/20 0.54
RAB9A P51151 3/20 0.53
POLB P06746 1/20 0.53
NR4A1 P22736 1/20 0.53
ALDH1A1 P00352 2/20 0.52
FAAH O00519 1/20 0.52
CYP3A4 P08684 1/20 0.52
ALOX15 P16050 1/20 0.52
TSHR P16473 1/20 0.52
HTT P42858 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
MEN1 O00255 3/20 0.50
KMT2A Q03164 3/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
CYP1A2 P05177 2/20 0.50
NPC1 O15118 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12972062 0.87 HPGD (0.57) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL8211088 0.87 MAPK1 (0.57) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL10191988 0.85 HPGD (0.71) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL30703669 0.84 HSD17B10 (1.00) HSD17B10HPGDRAB9APOLBNR4A1
SCHEMBL12133 0.84 HSD17B10 (1.00) HSD17B10HPGDRAB9APOLBNR4A1
SCHEMBL9202177 0.84 HPGD (0.57) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL10192104 0.84 HSD17B10 (0.54) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL10192006 0.84 HSD17B10 (0.54) HSD17B10HPGDLMNAMAPK1MAPT
SCHEMBL7980860 0.83 NPC1 (0.62) HPGDLMNAMAPK1MAPTRAB9A
SCHEMBL3424143 0.83 MAPK1 (0.69) HSD17B10HPGDLMNAMAPK1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7247422-B2 Heat—developable photosensitive material containing latex polymer in outermost layer FUJIFILM CORPORATION (JP) 2007-07-24 US disclosed