SCHEMBL1445976

SCHEMBL1445976

[CH2]C(O)CC1CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4105257 0.77 ALDH1A1 (0.38)
SCHEMBL819583 0.77 ALDH1A1 (0.38)
SCHEMBL3824911 0.74 ALDH1A1 (0.31)
SCHEMBL2884859 0.74
SCHEMBL2149050 0.74
SCHEMBL8442819 0.72
SCHEMBL669900 0.72 ALDH1A1 (0.35)
SCHEMBL10070931 0.72
SCHEMBL2802351 0.72
SCHEMBL193534 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-9003776-A None JP disclosed
CN-118043412-A Ink for inkjet recording and inkjet recording method 富士胶片株式会社 2024-05-14 CN disclosed
CN-114829505-B Molded body, precursor thereof, method for producing same, and use thereof 株式会社大赛璐 2024-05-03 CN disclosed
CN-115803399-B Ink set and printed matter 富士胶片株式会社 2024-03-08 CN disclosed
CN-115315490-B Ink for inkjet recording and image recording method 富士胶片株式会社 2024-03-01 CN disclosed
CN-116390858-A Image recording method 富士胶片株式会社 2023-07-04 CN disclosed
CN-116096576-A Ink for inkjet recording and inkjet recording method 富士胶片株式会社 2023-05-09 CN disclosed
CN-115996850-A Image recorded matter, active energy ray-curable ink, ink set, and method for producing image recorded matter 富士胶片株式会社 2023-04-21 CN disclosed
CN-114829505-A Molded body, precursor thereof, production method and use 株式会社大赛璐 2022-07-29 CN disclosed
EP-2289961-B1 New urethane groups containing silylated prepolymers and method for producing same EVONIK OPERATIONS GMBH (DE) 2020-11-25 EP disclosed
EP-1721945-B1 Ink composition FUJIFILM CORP (JP) 2007-08-15 EP disclosed
EP-1721945-A1 Ink composition Fuji Photo Film Co., Ltd. (JP) 2006-11-15 EP disclosed
EP-1349007-A1 Photosensitive Paste SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-10-01 EP disclosed
EP-1151014-A1 ANIONIC CELLULOSE ETHERS HAVING TEMPERATURE-DEPENDENT ASSOCIATIVE PROPERTIES Akzo Nobel N.V. (NL) 2001-11-07 EP disclosed
WO-2000035957-A1 ANIONIC CELLULOSE ETHERS HAVING TEMPERATURE-DEPENDENT ASSOCIATIVE PROPERTIES AKZO NOBEL N.V. (NL) 2000-06-22 WO disclosed
EP-0541747-B1 CROSS LINKABLE POLYMERIC COMPOSITION BOREALIS AS (DK) 1999-08-25 EP disclosed
JP-H093776-A TREATMENT OF POLYESTER FIBER TEIJIN LTD 1997-01-07 JP disclosed
EP-0541747-A1 CROSS LINKABLE POLYMERIC COMPOSITION BOREALIS A/S (DK) 1993-05-19 EP disclosed
WO-1992021721-A1 CROSS LINKABLE POLYMERIC COMPOSITION BP CHEMICALS LIMITED (GB) 1992-12-10 WO disclosed
EP-0013939-A2 Coating composition and process for producing synthetic resin moldings by using the same MITSUBISHI RAYON CO., LTD. (JP) 1980-08-06 EP disclosed