SCHEMBL14461880

SCHEMBL14461880

CCC(C)c1ccc(OCC(=O)N(CC)c2cccc3c(S(=O)(=O)O)cccc23)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 1/20 0.46
▸ TSHR P16473 1/20 0.46
▸ OXTR P30559 1/20 0.42
▸ MEN1 O00255 2/20 0.39
▸ KMT2A Q03164 2/20 0.39
▸ TDP1 Q9NUW8 2/20 0.39
▸ GAA P10253 1/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.38
▸ TP53 P04637 2/20 0.38
▸ CYP1A2 P05177 2/20 0.38
▸ MAPT P10636 1/20 0.37
▸ TRPM8 Q7Z2W7 1/20 0.37
▸ CASP1 P29466 1/20 0.37
▸ PTGS2 P35354 1/20 0.35
▸ NPC1 O15118 2/20 0.35
▸ RAB9A P51151 2/20 0.35
▸ POLB P06746 2/20 0.35
▸ CYP2C19 P33261 1/20 0.35
▸ HTT P42858 1/20 0.35
▸ HIF1A Q16665 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11922897 0.91 GAA (0.48) ALDH1A1TSHRMEN1KMT2AGAA
SCHEMBL14461744 0.89 ALDH1A1 (0.47) ALDH1A1TSHROXTRMEN1KMT2A
SCHEMBL14461764 0.82 GAA (0.41) ALDH1A1MEN1KMT2AGAASMN1; SMN2
SCHEMBL14461754 0.82 AKR1C3 (0.39) ALDH1A1TSHROXTRMEN1KMT2A
SCHEMBL11922890 0.79 ALDH1A1 (0.50) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL14461741 0.78 TP53 (0.57) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL17424270 0.76 ALDH1A1 (0.45) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL11922942 0.75 ALDH1A1 (0.50) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL11922950 0.74 ALDH1A1 (0.43) ALDH1A1TSHRMEN1KMT2ATDP1
SCHEMBL11922884 0.74 ALDH1A1 (0.49) ALDH1A1TSHRMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8673538-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2014-03-18 — — US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 — — US disclosed
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — US disclosed
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