SCHEMBL14461990

SCHEMBL14461990

CC(C)OC(Cl)CSc1ccc2ccccc2c1

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
BACE1 P56817 10/20 0.44
ANPEP P15144 1/20 0.39
EPHX1 P07099 1/20 0.39
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
CNR2 P34972 1/20 0.36
HTR2A P28223 1/20 0.36
HTR2C P28335 1/20 0.36
HTR2B P41595 1/20 0.36
ALDH1A1 P00352 1/20 0.35
LMNA P02545 1/20 0.35
MAPT P10636 1/20 0.35
UGT2B7 P16662 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL7243545 0.76 CYP3A4 (0.49) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL20495593 0.73 CYP3A4 (0.50) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL28251159 0.71 ANPEP (0.53) CYP3A4BACE1ANPEPCNR2ALDH1A1
SCHEMBL14461999 0.71 CYP3A4 (0.43) CYP3A4CYP2C9CYP2C19BACE1ALDH1A1
SCHEMBL5950852 0.70 BACE1 (0.47) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL5950846 0.70 BACE1 (0.47) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL20088011 0.69 BACE1 (0.58) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL27611903 0.69 BACE1 (0.58) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL27041447 0.69 CYP3A4 (0.52) CYP3A4CYP2C9CYP2C19BACE1ANPEP
SCHEMBL7376129 0.68 ANPEP (0.50) BACE1ANPEPCNR2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed