Isobutanol

Isobutanol

SCHEMBL144682

CC(C)CC(C)O.CC(C)CO

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 5/20 0.60
TDP1 Q9NUW8 1/20 0.56
ALDH1A1 P00352 4/20 0.37
MAPK1 P28482 1/20 0.35
ANPEP P15144 4/20 0.33
LMNA P02545 3/20 0.33
RNPEP Q9H4A4 1/20 0.32
SLC7A5 Q01650 1/20 0.32
LAP3 P28838 2/20 0.31
ERAP1 Q9NZ08 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1089695 0.89
SCHEMBL1090210 0.89
SCHEMBL17766840 0.89 TSHR (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
SCHEMBL15658 0.89
Ethylene Glycol SCHEMBL28094184 0.87 TDP1 (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
Alcohol SCHEMBL3796705 0.87 TSHR (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
SCHEMBL28242479 0.86
SCHEMBL27750160 0.86
Methyl Alcohol SCHEMBL19457756 0.86
SCHEMBL27825545 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 US disclosed
US-8741546-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-03 US disclosed
US-20130209936-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-15 US disclosed
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 US disclosed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 US disclosed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 US disclosed