Isobutanol

Isobutanol

SCHEMBL144682

CC(C)CC(C)O.CC(C)CO

nearest known ligand 0.60

Full drug profile on Sugi Atlas →

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ TSHR P16473 5/20 0.60
▸ TDP1 Q9NUW8 1/20 0.56
▸ ALDH1A1 P00352 4/20 0.37
▸ MAPK1 P28482 1/20 0.35
▸ ANPEP P15144 4/20 0.33
▸ LMNA P02545 3/20 0.33
▸ RNPEP Q9H4A4 1/20 0.32
▸ SLC7A5 Q01650 1/20 0.32
▸ LAP3 P28838 2/20 0.31
▸ ERAP1 Q9NZ08 1/20 0.31
▸ L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1089695 0.89 — —
SCHEMBL1090210 0.89 — —
SCHEMBL15658 0.89 — —
SCHEMBL17766840 0.89 TSHR (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
Alcohol SCHEMBL3796705 0.87 TSHR (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
Ethylene Glycol SCHEMBL28094184 0.87 TDP1 (0.47) TSHRTDP1ALDH1A1MAPK1ANPEP
Methyl Alcohol SCHEMBL19457756 0.86 — —
SCHEMBL27750160 0.86 — —
SCHEMBL28242479 0.86 — —
SCHEMBL27825545 0.86 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8895231-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-11-25 — — US disclosed
US-8741546-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-06-03 — — US disclosed
US-20130209936-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-15 — — US disclosed
US-8426115-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-04-23 — — US disclosed
US-20120058428-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-03-08 — — US disclosed
US-20110033803-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-02-10 — — US disclosed
US-20100159392-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-24 — — US disclosed
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