SCHEMBL14469878

SCHEMBL14469878

CCN(c1ccc(NC(=O)N[SH](=O)=O)c(C)c1)C(C)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 4/20 0.42
MAPT P10636 9/20 0.40
GFER P55789 4/20 0.40
SMN1; SMN2 Q16637 4/20 0.40
LMNA P02545 3/20 0.40
CYP2C19 P33261 2/20 0.40
CYP1A2 P05177 1/20 0.40
POLB P06746 2/20 0.39
MAPK1 P28482 5/20 0.39
ALDH1A1 P00352 3/20 0.39
ALOX15 P16050 2/20 0.39
NPSR1 Q6W5P4 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
THRB P10828 1/20 0.39
HSD17B10 Q99714 2/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
GAA P10253 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8595224 0.83 HTT (0.46) HTTMAPTGFERSMN1; SMN2LMNA
SCHEMBL14469879 0.83 MAPT (0.55) HTTMAPTGFERSMN1; SMN2LMNA
SCHEMBL8593641 0.77 ESR1 (0.39) HTTMAPTGFERSMN1; SMN2LMNA
SCHEMBL11751064 0.72 IGLV6-57 (0.36) HTTMAPTGFERSMN1; SMN2LMNA
SCHEMBL13967036 0.72 S1PR1 (0.42) MAPTSMN1; SMN2LMNAALDH1A1NPC1
SCHEMBL14470199 0.72 MAPT (0.46) HTTMAPTGFERSMN1; SMN2LMNA
SCHEMBL24691475 0.71 MAPT (0.42) HTTMAPTLMNAPOLBALDH1A1
SCHEMBL11582672 0.70 ESR1 (0.42)
SCHEMBL11114625 0.68 S100B (0.59) GFERMAPK1ALDH1A1ALOX15THRB
SCHEMBL793451 0.68 S100B (0.59) GFERMAPK1ALDH1A1ALOX15THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7250249-B2 Black and white photothermographic material FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed
US-7247421-B2 Image forming method using photothermographic material FUJIFILM CORPORATION (JP) 2007-07-24 US disclosed