SCHEMBL14476089

SCHEMBL14476089

CCCCOc1ccc(SCCCCO)c2ccccc12

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ CNR2 P34972 7/20 0.45
▸ CNR1 P21554 6/20 0.45
▸ MEN1 O00255 1/20 0.43
▸ HTT P42858 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ IDO1 P14902 1/20 0.43
▸ PTGS2 P35354 5/20 0.43
▸ SLC2A1 P11166 1/20 0.43
▸ CYP2C9 P11712 2/20 0.41
▸ GAA P10253 1/20 0.40
▸ TDP1 Q9NUW8 1/20 0.40
▸ L3MBTL1 Q9Y468 1/20 0.40
▸ THRA P10827 1/20 0.39
▸ THRB P10828 1/20 0.39
▸ CYP1A2 P05177 1/20 0.39
▸ CYP2C19 P33261 1/20 0.39
▸ HTR1B P28222 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15889888 0.92 IDO1 (0.50) CNR2CNR1MEN1HTTKMT2A
SCHEMBL10192728 0.92 MEN1 (0.47) CNR2CNR1MEN1HTTKMT2A
SCHEMBL14407862 0.90 CNR1 (0.47) CNR2CNR1MEN1HTTKMT2A
SCHEMBL14839250 0.87 MEN1 (0.52) CNR2CNR1MEN1HTTKMT2A
SCHEMBL17285481 0.84 MEN1 (0.43) CNR2CNR1MEN1HTTKMT2A
SCHEMBL25738337 0.83 PTGS2 (0.47) CNR2CNR1MEN1HTTKMT2A
SCHEMBL18872216 0.83 MEN1 (0.45) CNR2CNR1MEN1HTTKMT2A
SCHEMBL19245461 0.82 PTGS2 (0.49) CNR2CNR1MEN1HTTKMT2A
SCHEMBL15521596 0.82 PTGS2 (0.46) CNR2CNR1MEN1HTTKMT2A
SCHEMBL18256394 0.82 PTGS2 (0.43) CNR2CNR1MEN1HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20130029255-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-31 — — US disclosed
WO-2013002295-A1 METHOD OF FORMING PATTERN AND ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 — — WO disclosed
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