SCHEMBL14477152

SCHEMBL14477152

CC(C)(C)CC(C)(C(=O)Oc1cccc2c(O)cccc12)C(C)(C)C

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 13/20 0.48
▸ ESR2 Q92731 13/20 0.48
▸ KMT2A Q03164 6/20 0.48
▸ GAA P10253 6/20 0.48
▸ MEN1 O00255 5/20 0.48
▸ SMN1; SMN2 Q16637 2/20 0.48
▸ HSD17B10 Q99714 2/20 0.48
▸ JAK2 O60674 1/20 0.48
▸ USP2 O75604 1/20 0.48
▸ MAPT P10636 1/20 0.48
▸ ALOX15 P16050 1/20 0.48
▸ NPSR1 Q6W5P4 1/20 0.48
▸ POLB P06746 2/20 0.46
▸ ELANE P08246 1/20 0.35
▸ SLC6A2 P23975 1/20 0.34
▸ SLC6A4 P31645 1/20 0.34
▸ SLC6A3 Q01959 1/20 0.34
▸ CDK2 P24941 1/20 0.34
▸ ALDH1A1 P00352 2/20 0.34
▸ PGR P06401 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13161550 0.92 ESR1 (0.41) ESR1ESR2KMT2AGAAMEN1
SCHEMBL12205969 0.85 ELANE (0.41) KMT2AGAASMN1; SMN2HSD17B10JAK2
SCHEMBL19249588 0.82 ELANE (0.32) ESR1ESR2KMT2AGAAMEN1
SCHEMBL25524624 0.81 CA1 (0.35) KMT2AMEN1MAPTPOLBELANE
SCHEMBL18785883 0.81 ESR1 (0.57) ESR1ESR2KMT2AGAAMEN1
SCHEMBL14577613 0.78 CYBB (0.34) ESR1ESR2KMT2AGAAMEN1
SCHEMBL92373 0.78 ESR1 (0.51) ESR1ESR2KMT2AGAAMEN1
SCHEMBL20274282 0.77 ESR1 (0.52) ESR1ESR2KMT2AGAAMEN1
SCHEMBL18671983 0.76 ESR1 (0.49) ESR1ESR2KMT2AGAAMEN1
SCHEMBL14220068 0.76 ESR1 (0.49) ESR1ESR2KMT2AGAAMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2412733-B1 Polymer, chemically amplified negative resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2016-03-23 — — EP disclosed
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