SCHEMBL19249588

SCHEMBL19249588

CC(O)c1cccc2c(OC(=O)C(C)(CC(C)(C)C)C(C)(C)C)cccc12

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 2/20 0.32
▸ ALDH1A1 P00352 3/20 0.31
▸ GAA P10253 3/20 0.31
▸ SMN1; SMN2 Q16637 2/20 0.31
▸ KCNK3 O14649 1/20 0.31
▸ KCNK9 Q9NPC2 1/20 0.31
▸ ESR1 P03372 4/20 0.31
▸ ESR2 Q92731 4/20 0.31
▸ HSD17B10 Q99714 3/20 0.31
▸ PGR P06401 1/20 0.31
▸ PTGS1 P23219 1/20 0.31
▸ MAPK1 P28482 1/20 0.31
▸ MEN1 O00255 2/20 0.30
▸ KMT2A Q03164 2/20 0.30
▸ KDM4E B2RXH2 1/20 0.30
▸ JAK2 O60674 1/20 0.30
▸ USP2 O75604 1/20 0.30
▸ MAPT P10636 1/20 0.30
▸ ALOX15 P16050 1/20 0.30
▸ NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14477152 0.82 ESR1 (0.48) ELANEALDH1A1GAASMN1; SMN2ESR1
SCHEMBL13706058 0.81 ELANE (0.34) ELANEALDH1A1GAASMN1; SMN2ESR1
SCHEMBL13161550 0.76 ESR1 (0.41) ELANEGAASMN1; SMN2ESR1ESR2
SCHEMBL15179698 0.73 LMNA (0.37) ELANEALDH1A1
SCHEMBL12205969 0.73 ELANE (0.41) ELANEALDH1A1GAASMN1; SMN2HSD17B10
SCHEMBL21973906 0.70 ELANE (0.50) ELANESMN1; SMN2ESR1
SCHEMBL14219266 0.70 ALDH1A1 (0.48) ALDH1A1GAASMN1; SMN2HSD17B10PGR
SCHEMBL13486819 0.68 LPAR1 (0.42) ALDH1A1KCNK3KCNK9HSD17B10MAPK1
SCHEMBL25524624 0.68 CA1 (0.35) ELANEALDH1A1MEN1KMT2AMAPT
SCHEMBL14477148 0.68 KDM4E (0.34) ELANEALDH1A1GAAHSD17B10MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3081988-B1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-08-16 — — EP disclosed
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