SCHEMBL14477157

SCHEMBL14477157

COC(COc1cccc2ccccc12)OC

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR2E1 Q9Y466 6/20 0.60
CYP1A2 P05177 4/20 0.58
KDM4E B2RXH2 1/20 0.58
MEN1 O00255 1/20 0.58
CYP2C19 P33261 1/20 0.58
KMT2A Q03164 1/20 0.58
HTR1B P28222 6/20 0.54
CYP2D6 P10635 4/20 0.54
ADRB2 P07550 4/20 0.54
ADRB1 P08588 4/20 0.54
SIGMAR1 Q99720 4/20 0.54
SLC6A4 P31645 4/20 0.54
HTR2B P41595 3/20 0.54
ALDH1A1 P00352 3/20 0.54
ADRB3 P13945 3/20 0.54
HTR2A P28223 3/20 0.54
HTR2C P28335 3/20 0.54
HTR6 P50406 3/20 0.54
SCN1A P35498 2/20 0.54
SLC10A1 Q14973 2/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6298086 0.89 NR2E1 (0.46) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL14461598 0.84 NR2E1 (0.62) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL19683357 0.82 NR2E1 (0.44) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL5031818 0.81 NR2E1 (0.64) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL29829725 0.81 NR2E1 (0.64) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL18651710 0.81 NR2E1 (0.68) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL8914883 0.80 NR2E1 (0.66) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL8912914 0.80 NR2E1 (0.66) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL7105429 0.79 KCNA3 (0.58) NR2E1CYP1A2KDM4EMEN1CYP2C19
SCHEMBL9244006 0.79 NR2E1 (0.60) NR2E1CYP1A2KDM4EMEN1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed