SCHEMBL14477158

SCHEMBL14477158

CCCCOC(COc1cccc2ccccc12)OCCCC

nearest known ligand 0.57

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
HTR1B P28222 9/20 0.56
HTR1D P28221 2/20 0.53
NR2E1 Q9Y466 2/20 0.52
SLC6A4 P31645 1/20 0.50
HRH1 P35367 1/20 0.50
KDM4E B2RXH2 1/20 0.50
MEN1 O00255 1/20 0.50
CYP1A2 P05177 1/20 0.50
CYP2C19 P33261 1/20 0.50
KMT2A Q03164 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14477159 0.86 HTR1B (0.53) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL1004658 0.84 HTR1B (0.73) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL8220039 0.80 CYP1A2 (0.51) HTR1BMEN1CYP1A2CYP2C19KMT2A
SCHEMBL250503 0.79 HTR1B (0.71) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL9011586 0.78 HTR1B (0.66) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL9011564 0.78 HTR1B (0.66) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL18551586 0.78 HTR1B (0.69) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL20506760 0.78 HTR1B (0.69) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL755688 0.78 HTR1B (0.69) HTR1BHTR1DNR2E1SLC6A4HRH1
SCHEMBL1681954 0.78 HTR1B (0.69) HTR1BHTR1DNR2E1SLC6A4HRH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8574814-B2 Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the composition FUJIFILM CORPORATION (JP) 2013-11-05 US disclosed
US-20130004888-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2013-01-03 US disclosed