SCHEMBL14498647

SCHEMBL14498647

CCCCCCNC(=O)c1cccc(-n2nnnc2S)c1

nearest known ligand 0.52

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.52
▸ NAAA Q02083 2/20 0.51
▸ TP53 P04637 4/20 0.46
▸ RXFP1 Q9HBX9 1/20 0.46
▸ KDR P35968 1/20 0.44
▸ L3MBTL1 Q9Y468 2/20 0.44
▸ NPC1 O15118 1/20 0.43
▸ RAB9A P51151 1/20 0.43
▸ HPGD P15428 1/20 0.42
▸ ASAH1 Q13510 1/20 0.42
▸ LMNA P02545 1/20 0.42
▸ MAPT P10636 2/20 0.42
▸ CYP3A4 P08684 1/20 0.42
▸ CYP2C9 P11712 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ MYOF Q9NZM1 1/20 0.42
▸ GAA P10253 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8943738 1.00 SMN1; SMN2 (0.52) SMN1; SMN2NAAATP53RXFP1KDR
SCHEMBL14498644 1.00 SMN1; SMN2 (0.52) SMN1; SMN2NAAATP53RXFP1KDR
SCHEMBL14160711 0.93 SMN1; SMN2 (0.46) SMN1; SMN2TP53RXFP1L3MBTL1HPGD
SCHEMBL14498645 0.86 TP53 (0.49) SMN1; SMN2TP53NPC1RAB9AHPGD
SCHEMBL14032683 0.83 TP53 (0.45) SMN1; SMN2TP53L3MBTL1NPC1RAB9A
SCHEMBL5406321 0.83 TP53 (0.46) TP53MAPT
SCHEMBL14498660 0.83 EPHX1 (0.57) —
SCHEMBL14498658 0.81 SMN1; SMN2 (0.53) SMN1; SMN2NAAATP53RXFP1KDR
SCHEMBL9869255 0.80 LMNA (0.48) SMN1; SMN2TP53L3MBTL1NPC1RAB9A
SCHEMBL14498649 0.80 SMN1; SMN2 (0.54) SMN1; SMN2NAAATP53RXFP1KDR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7235352-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-06-26 — — US disclosed
US-20070117054-A1 Photothermographic material FUJI PHOTO FILM CO., LTD. 2007-05-24 — — US disclosed
US-7211373-B2 Photothermographic material FUJIFILM CORPORATION (JP) 2007-05-01 — — US disclosed
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