SCHEMBL145236

SCHEMBL145236

C=C(C)C(=O)N(CC)CCCCCC

nearest known ligand 0.47

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 1/20 0.47
CA12 O43570 4/20 0.46
CA1 P00915 4/20 0.46
CA9 Q16790 4/20 0.46
TSHR P16473 2/20 0.43
ZDHHC20 Q5W0Z9 2/20 0.42
ZDHHC2 Q9UIJ5 1/20 0.42
CA2 P00918 2/20 0.42
THRA P10827 1/20 0.40
THRB P10828 1/20 0.40
MMP1 P03956 1/20 0.37
MMP2 P08253 1/20 0.37
MMP3 P08254 1/20 0.37
MMP8 P22894 1/20 0.37
DNM1 Q05193 3/20 0.37
CES2 O00748 3/20 0.35
CES1 P23141 3/20 0.35
GAA P10253 1/20 0.35
HPGD P15428 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL418166 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL12200650 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL12200653 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL6117727 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL375611 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL6117310 1.00 MGLL (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL375381 0.98 CA12 (0.47) MGLLCA12CA1CA9TSHR
SCHEMBL431375 0.92 TSHR (0.46) MGLLCA12CA1CA9TSHR
SCHEMBL4085872 0.92 TSHR (0.46) MGLLCA12CA1CA9TSHR
SCHEMBL372656 0.92 TSHR (0.46) MGLLCA12CA1CA9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 605 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2408886-B1 FAST DRYING AMPHOLYTIC POLYMERS FOR CLEANING COMPOSITIONS BASF SE (DE) 2013-11-13 EP claimed
EP-3728512-B1 AQUEOUS FORMULATIONS OF SURFACTANTS AND ASSOCIATIVE POLYMERS FOR THE ASSISTED RECOVERY OF PETROLEUM ENERGY SOLUTIONS US LLC (US) 2024-07-03 EP disclosed
EP-3774958-B1 GELLED AQUEOUS COMPOSITION FOR OIL EXTRACTION ENERGY SOLUTIONS US LLC (US) 2024-06-05 EP disclosed
EP-4370567-A1 PREPARATION OF AMPHIPHILIC BLOCK POLYMERS BY REVERSE RADICAL MICELLAR POLYMERISATION SPECIALTY OPERATIONS FRANCE (FR) 2024-05-22 EP disclosed
WO-2024085570-A1 FLUORINE-BASED POLYMER AND METHOD FOR PREPARING SAME 한국화학연구원 2024-04-25 WO disclosed
US-11787992-B2 Suspension of associative polymers for the treatment of underground formations Energy Solutions (US) LLC (US) 2023-10-17 US disclosed
US-11753493-B2 Amphiphilic block polymers soluble in strongly saline medium Energy Solutions (US) LLC (US) 2023-09-12 US disclosed
EP-3548584-B1 POLYMERIC SYSTEMS FOR PARTICLE DISPERSION ENERGY SOLUTIONS US LLC (US) 2023-07-19 EP disclosed
US-11649390-B2 Suspending agents obtained by micellar polymerization Energy Solutions (US) LLC (US) 2023-05-16 US disclosed
US-11608391-B2 Progressive salting-out of polymer chains in a liquid medium RHODIA OPERATIONS (FR) 2023-03-21 US disclosed
EP-1038891-A2 Water soluble or water dispersable polymeric salts BASF AKTIENGESELLSCHAFT (DE) 2000-09-27 EP disclosed
EP-1002811-A2 Soluble or water-dispersible graft copolymers based on a polyvinyllactam, the preparation and use thereof BASF AKTIENGESELLSCHAFT (DE) 2000-05-24 EP disclosed
EP-0992235-A1 Cometic composition BASF AKTIENGESELLSCHAFT (DE) 2000-04-12 EP disclosed
WO-2000012588-A1 URETHANE(METH)ACRYLATES CONTAINING SILOXANE GROUPS AND ABLE TO UNDERGO FREE-RADICAL POLYMERISATION BASF AKTIENGESELLSCHAFT (DE) 2000-03-09 WO disclosed
WO-1999058100-A1 COSMETIC PRODUCT BASF AKTIENGESELLSCHAFT (DE) 1999-11-18 WO disclosed
EP-0957119-A1 Cross-linked, water-soluble or water-dispersible polyurethanes BASF AKTIENGESELLSCHAFT (DE) 1999-11-17 EP disclosed
US-5985992-A WATER DISPERSION OF SALT SOLUTION, ANIONIC VINYL ADDITION POLYMER WITH ACRYLIC OR SULFONIC GROUPS CYTEC TECHNOLOGY CORP. (US) 1999-11-16 US disclosed
WO-1999029745-A1 ANIONIC POLYMER PRODUCTS AND PROCESSES CYTEC TECHNOLOGY CORP. (US) 1999-06-17 WO disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed