SCHEMBL1453153

SCHEMBL1453153

CCC(CC)O[SiH2]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19511719 0.72
SCHEMBL246513 0.67 TSHR (0.41)
SCHEMBL8024009 0.67 TSHR (0.33)
SCHEMBL21812057 0.67
SCHEMBL131495 0.64
Ammonia Solution, Strong SCHEMBL1335263 0.64 TSHR (0.39)
SCHEMBL355220 0.62
SCHEMBL6429025 0.61
SCHEMBL413732 0.61
SCHEMBL131494 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 85 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10032788-B2 Semiconductor memory device TOSHIBA MEMORY CORPORATION (JP) 2018-07-24 US claimed
US-9548373-B2 Nonvolatile semiconductor memory device KABUSHIKI KAISHA TOSHIBA (JP) 2017-01-17 US claimed
US-20160284869-A1 SEMICONDUCTOR MEMORY DEVICE KABUSHIKI KAISHA TOSHIBA (JP) 2016-09-29 US claimed
US-20160087067-A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE KABUSHIKI KAISHA TOSHIBA (JP) 2016-03-24 US claimed
EP-0045523-B1 ALPHA-SUBSTITUTED UREIDOBENZYLPENICILLANIC ACID DERIVATIVES AND PROCESS FOR PRODUCING THE SAME Chugai Seiyaku Kabushiki Kaisha (JP) 1984-12-05 EP claimed
EP-0045523-A1 Alpha-substituted ureidobenzylpenicillanic acid derivatives and process for producing the same Chugai Seiyaku Kabushiki Kaisha (JP) 1982-02-10 EP claimed
US-20240199814-A1 SILICONE RESIN COMPOSITION JNC CORPORATION (JP) 2024-06-20 US disclosed
EP-4368672-A1 SILICONE RESIN COMPOSITION JNC Corporation (JP) 2024-05-15 EP disclosed
WO-2024089957-A1 SILICONE RESIN COMPOSITION JNC株式会社 2024-05-02 WO disclosed
WO-2024018654-A1 SURFACE LAYER, OPTICAL MEMBER, EYEGLASSES AND MATERIAL FOR FORMING SURFACE LAYER キヤノンオプトロン株式会社 2024-01-25 WO disclosed
CN-117098813-A Silicone resin composition 捷恩智株式会社 2023-11-21 CN disclosed
US-11732167-B2 Silane-containing high modulus urethane adhesives DDP SPECIALTY ELECTRONIC MATERIALS US, LLC (US) 2023-08-22 US disclosed
WO-2023080221-A1 COMPOUND, POLYMER, PHOTOSTABILIZER COMPOSITION, RESIN COMPOSITION, COATING MATERIAL COMPOSITION, ARTICLE, SEALING MATERIAL, MOLDED ARTICLE, METHOD FOR PRODUCING WEATHER-RESISTANT RESIN COMPOSITION, AND METHOD FOR IMPROVING WEATHER RESISTANCE OF SYNTHETIC RESIN 株式会社ADEKA 2023-05-11 WO disclosed
EP-0991687-A1 POWDER COATINGS OR ADHESIVES EMPLOYING SILANES OR SILANE TREATED FILLERS CROMPTON CORPORATION (US) 2000-04-12 EP disclosed
WO-1999055754-A1 POWDER COATINGS OR ADHESIVES EMPLOYING SILANES OR SILANE TREATED FILLERS CK WITCO CORPORATION (US) 1999-11-04 WO disclosed
US-5869723-A PRODUCING HIGHLY ACTIVE POLYMER WHICH DOES NOT ATTACH TO INNER WALL OF REACTOR SHOWA DENKO K.K. (JP) 1999-02-09 US disclosed
EP-0775707-A1 IONIC COMPOUNDS AND CATALYST FOR OLEFIN POLYMERIZATION USING THE COMPOUNDS SHOWA DENKO KABUSHIKI KAISHA (JP) 1997-05-28 EP disclosed
EP-0045523-B1 ALPHA-SUBSTITUTED UREIDOBENZYLPENICILLANIC ACID DERIVATIVES AND PROCESS FOR PRODUCING THE SAME Chugai Seiyaku Kabushiki Kaisha (JP) 1984-12-05 EP disclosed
US-4355038-A BACTERICIDES CHUGAI SEIYAKU KABUSHIKI KAISHA (JP) 1982-10-19 US disclosed
EP-0045523-A1 Alpha-substituted ureidobenzylpenicillanic acid derivatives and process for producing the same Chugai Seiyaku Kabushiki Kaisha (JP) 1982-02-10 EP disclosed